Symposium Information

Photomask Japan 2027
The 33rd Symposium on Photomask and NGL Mask Technology


Date : Wednesday, April 7 - Friday, April 9, 2027
Venue : Annex Hall, PACIFICO YOKOHAMA, Yokohama, Japan
Official Language

: English
Organized by : Photomask Japan and SPIE
Co-organized by : BACUS and EMLC

Technical Exhibition in Cooperation with SEMI Japan
TOP