Thank you very much for your participation in Photomask Japan2026.

We sincerely thank all participants for participating in Photomask Japan 2026(PMJ2026).
We are pleased to inform you that the Tutorial Session is now available as on-demand streaming for all participants!
Photomask Japan2026(PMJ2026)にご参加いただき心より御礼申し上げます。
ご参加いただいた皆様へ感謝を込め、チュートリアルセッションのオンデマンド配信をお届けさせていただきます。


*Access is available after logging in with registration./ご視聴にはログイン・参加登録が必要となってまいります。

Date: April 8(Wed.)-10(Fri.), 2026.
Venue:  Annex Hall, PACIFICO YOKOHAMA, Yokohama, Japan


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Program Summary of Past PMJs (Written in Japanese)


PMJ2026学会報告   PMJ2025学会報告   PMJ2024学会報告   PMJ2023学会報告   PMJ2022学会報告

Photomask Japan 2026 is the 32nd international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion.


Photomask Japan Secretariat

c/o PCO, Inc.
2-25 Sakurabashidori, Toyama, 930-0004
E-mail: pmj@pcojapan.jp
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