Date: April 8(Wed.)-10(Fri.), 2026.
Venue:  Annex Hall, PACIFICO YOKOHAMA, Yokohama, Japan


What's New!
  • 1st Announcement is available. [2025.06.12]
  • We have opened the PMJ 2026 website! [2025.06.12]


Program Summary of Past PMJs (Written in Japanese)


PMJ2025学会報告   PMJ2024学会報告   PMJ2023学会報告   PMJ2022学会報告   PMJ2021学会報告

Photomask Japan 2026 is the 32nd international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion.


Photomask Japan Secretariat

c/o PCO Co., Ltd.

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