Last Minute Information
Thank you very much for your participate in Photomask Japan2026. Please review the information before visiting.
Photomask Japan2026にご関心をお寄せいただき心より御礼申し上げます。ご案内をご確認の上ご来場をお願い申し上げます。
◆Information／総合案内
◆Tutorial／チュートリアル
◆Symposium／シンポジウム
◆Exhibition／技術展示会

Date: April 8(Wed.)-10(Fri.), 2026.
Venue:  Annex Hall, PACIFICO YOKOHAMA, Yokohama, Japan


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Program Summary of Past PMJs (Written in Japanese)


PMJ2025学会報告   PMJ2024学会報告   PMJ2023学会報告   PMJ2022学会報告   PMJ2021学会報告

Photomask Japan 2026 is the 32nd international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion.


Photomask Japan Secretariat

c/o PCO, Inc.
2-25 Sakurabashidori, Toyama, 930-0004
E-mail: pmj@pcojapan.jp
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