Tutorial
We sincerely thank all participants for participating in Photomask Japan 2026(PMJ2026).
We are pleased to inform you that the Tutorial Session is now available as on-demand streaming for all participants!
*Registration is required to access the streaming.
日本語ページ
Photomask Japan 2026
Special Pre-event Program【Tutorial】
| Event Name |
: “Basic Knowledge of Photomasks That You Should Know Now" |
| Date |
: April 7(Tue.), 2026 14:00 - 17:30 |
| Venue |
: Annex Hall, PACIFICO YOKOHAMA, Yokohama, Japan |
| Registration Fee |
: Free of charge *Only for Tutorial session (April 7 only) |
| Language |
: Japanese （Presentation file is in English） |
| Note |
: Simultaneous English interpretation will be available. *Quantities are limited. |
Program
*You may click on the speaker's name to view the speaker's profile and abstract!
| Time |
Instruction |
Speaker |
Affiliation |
| 14:00 - 14:05 |
Opening Remark |
Noriaki Nakayamada |
Taiwan Semiconductor Manufacturing Company, Ltd. |
| 14:05 - 14:25 |
Basic of Lithography and Mask |
Naoya Hayashi |
Dai Nippon Printing Co., Ltd.
|
| 14:25 - 14:45 |
Mask substrate |
Kentaro Iwamoto |
HOYA Corporation |
| 14:45 - 15:05 |
Resist material |
Kei Yamamoto |
FUJIFILM Corporation |
| 15:05 - 15:25 |
Data Processing in Semiconductor Manufacturing |
Kokoro Kato |
Synopsys |
| 15:25 - 15:45 |
Drawing |
Rieko Nishimura |
NuFlare Technology, Inc. |
| 15:45 - 16:00 |
Break |
|
|
| 16:00 - 16:20 |
Etching process |
Yoshinori Iino |
Shibaura Mechatronics Corporation |
| 16:20 - 16:40 |
CD/EPE Measurement |
Hiroshi Yoshiga |
Hitachi High-Tech Corporation |
| 16:40 - 17:00 |
Inspection |
Hiroki Miyai |
Lasertec Corporation |
| 17:00 - 17:20 |
Pellicle |
Yosuke Ono |
Mitsui Chemicals, Inc. |
| 17:20 - 17:30 |
Closing Remark |
Noriaki Nakayamada |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Registration
Kindly review the following instructions and proceed with the registration using the button below.
Please refer the guidance here.
1．Participants attending Tutorial (April 7) only
・After registering your personal information under “Participant Registration,” please select the following options on the payment page.
Category … April 7 Only
Option1 … Tutorial Session Entry (April 7)
・This option allows participation in the Tutorial (April 7) only.
If you wish to attend the Main Symposium, Technical Exhibition, or Banquet starting from April 8,
please select the appropriate category and complete the payment.
・Please note that this option does NOT include a congress bag.
Options 2 and 3 are not available for selection with this menu.
2．Participants attending the Main Symposium from April 8 onward
・After registering your personal information, please select the following options on the payment page.
Category … Please select the appropriate category
Option1 … Tutorial Session Entry (April 7)
・Please keep your name badge and wear it during the symposium, as it will serve as your access pass.
Inquiry
Photomask Japan Secretariat
c/o PCO, Inc.
2-25 Sakurabashidori, Toyama, 930-0004
E-mail: pmj@pcojapan.jp