Tutorial

日本語ページ

Event Name	: “Basic Knowledge of Photomasks That You Should Know Now"
Date	: April 7(Tue.), 2026 14:00 - 17:30
Venue	: Annex Hall, PACIFICO YOKOHAMA, Yokohama, Japan
Registration Fee	: Free of charge　*Only for Tutorial session (April 7 only)
Note	:Simultaneous English interpretation will be available.

Program

*You may click on the speaker's name to view the speaker's profile and abstract!

Time	Instruction	Speaker	Affiliation
14:00 - 14:05	Opening Remark	Noriaki Nakayamada	Taiwan Semiconductor Manufacturing Company, Ltd.
14:05 - 14:25	Basic of Lithography and Mask	Naoya Hayashi	Dai Nippon Printing Co., Ltd.
14:25 - 14:45	Mask substrate	Kentaro Iwamoto	HOYA Corporation
14:45 - 15:05	Resist material	Kei Yamamoto	FUJIFILM Corporation
15:05 - 15:25	Data Processing in Semiconductor Manufacturing	Kokoro Kato	Synopsys
15:25 - 15:45	Drawing	Rieko Niahimura	NuFlare Technology, Inc.
15:45 - 16:00	Break
16:00 - 16:20	Etching process	Yoshinori Iino	Shibaura Mechatronics Corporation
16:20 - 16:40	CD/EPE Measurement	Hiroshi Yoshiga	Hitachi High-Tech Corporation
16:40 - 17:00	Inspection	Hiroki Miyai	Lasertec Corporation
17:00 - 17:20	Pellicle	Yosuke Ono	Mitsui Chemicals, Inc.
17:20 - 17:30	Closing Remark	Noriaki Nakayamada	Taiwan Semiconductor Manufacturing Company, Ltd.

Registration

Kindly review the following instructions and proceed with the registration using the button below.
Please refer the guidance here.

1．Participants attending Tutorial (April 7) only

・After registering your personal information under “Participant Registration,” please select the following options on the payment page.
Category … April 7 Only
Option1 … Tutorial Session Entry (April 7)

・This option allows participation in the Tutorial (April 7) only.
If you wish to attend the Main Symposium, Technical Exhibition, or Banquet starting from April 8,
please select the appropriate category and complete the payment.

・Please note that this option does NOT include a congress bag.
　Options 2 and 3 are not available for selection with this menu.

2．Participants attending the Main Symposium from April 8 onward

・After registering your personal information, please select the following options on the payment page.
Category … Please select the appropriate category
Option1 … Tutorial Session Entry (April 7)

・Please keep your name badge and wear it during the symposium, as it will serve as your access pass.

Inquiry

Photomask Japan Secretariat
c/o PCO, Inc.
2-25 Sakurabashidori, Toyama, 930-0004
E-mail: pmj@pcojapan.jp