Tutorial Speaker

Basics of Semiconductor Lithography and Photomask

Naoya Hayashi (Dai Nippon Printing Co., Ltd.)

Biography

Naoya Hayashi received his BS degree in applied chemistry, and MS degree in electronic chemistry from Tokyo Institute of Technology, Tokyo, Japan. He joined Dai Nippon Printing Co., Ltd. (DNP) in 1977. He has been responsible for development of photomask technologies for about 45 years at DNP, such as electron beam exposure systems, resist materials and processes, phase-shifting materials, NGL masks for EUV and Nanoimprint. He is the first Research Fellow of DNP since 2007. He was recognized as a SPIE Fellow in 2011. He was the Conference Chair of SPIE Photomask Japan, BACUS (SPIE Photomask Technology), and received the Lifetime Achievement Award in 2016. He retired from DNP, and was recognized as the first DNP Honorary Fellow in June 2022. He is currently working for DNP as a part-time advisor.

Abstract

Semiconductor lithography technologies and photomasks have been indispensable elements supporting semiconductor device manufacturing for more than half a century, evolving along the way. In this lecture, I would like to discuss their fundamentals, history, and prospects for future.