Symposium Information

Photomask Japan 2026
The 32nd Symposium on Photomask and NGL Mask Technology


Date : Wednesday, April 8 - Friday, April 10, 2026
Venue : Annex Hall, PACIFICO YOKOHAMA, Yokohama, Japan
Official Language

: English
Organized by : Photomask Japan and SPIE
Co-organized by : BACUS and EMLC

Technical Exhibition in Cooperation with SEMI Japan
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