The 43rd International Conference of Photopolymer Science and Technology
ICPST-43 (2026)

Materials & Processes for Advanced Lithography, Nanotechnology and Phototechnology

The International Conference of Photopolymer Science and Technology (ICPST) is organized by the Society of Photopolymer Science and Technology (SPST) in cooperation with the Technical Association of Photopolymers, Japan, The Chemical Society of Japan, The Society of Polymer Science, Japan , The Japan Society of Applied Physics, Japan, and The Japan Additive Manufacturing Society.


June 23 - 26, 2026 at Arcrea HIMEJI, Himeji City, Hyogo, Japan

Himeji City｜Arcrea HIMEJI (himeji-ccc.jp) (Map)

Facility overview and Direction to the Conference Site (Arcrea HIMEJI) / Gourmet map near Himeji Station


The 43rd International Conference of Photopolymer Science and Technology, Materials & Processes for Advanced Lithography, Nanotechnology and Phototechnology (ICPST-43, 2026) will be held at Arcrea HIMEJI, Himeji City, Hyogo, Japan, on June 23-26, 2026. All the contributors of papers on the scientific progress and the technical development related to photopolymers are cordially invited.

News

  • 2025/12/25 We are excited to announce that the call for papers for ICPST-43 (2026) is now officially open! Please complete your submission by February 14, 2026 (11:59 JST).
  • 2025/12/25 The Website is announced!

Important Date

*All dates are based on Japan Standard Time (JST).

Abstract Submission Deadline: February 14, 2026
Manuscript Submission Deadline: April 1, 2026
Early-Bird Registration Deadline: May 31, 2026
Conference Date: June 23-26, 2026
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