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ICPST-43 (2026)
Call For Papers
The 43rd International Conference of Photopolymer Science and Technology, Materials & Processes for Advanced Lithography, Nanotechnology and Phototechnology (ICPST-43, 2026) will be held at Arcrea HIMEJI, Himeji City, Hyogo, Japan, on June 23-26, 2026.All the contributors of papers on the scientific progress and the technical development related to photopolymers are cordially invited.
Important Date
*All dates are based on Japan Standard Time (JST).Abstract Submission Period: December 26, 2025 - February 14, 2026
Manuscript Submission Deadline: April 1, 2026
Abstract Requirements
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• Describe the contents for technical review and ICPST web program
• English (E): Less than 100 words (maximum 500 characters)
• Japanese (J1 only): Less than 200 characters
Invited speakers are also requested to upload a photograph and a short biography through the submission system in addition to title and author information.
Detailed instructions and the submission link will be provided separately by email to all invited speakers.
Abstract Submission
Registrations sent via e-mail, fax, or post will not be accepted. Please read the following instructions carefully before starting your abstract submission.1. Refer to the guidelines below for instructions on submitting your abstract:
2. Please click the button below to submit your abstract:
*Input errors may affect the review process. Please make sure to follow the guidelines above.
Abstract Submission Period: December 26, 2025 - February 14, 2026 (11:59 p.m. JST)
*Please note: you will not receive a confirmation email upon submission.
*During the extended submission period, reviews are conducted as abstracts are received.
Please note that you cannot edit your abstract on My Page once it has been assigned for review.
If you need to make any changes, please contact the Secretariat at spst@pcojapan.jp.
Scopes
The conference covers a wide range of topics relevant to photopolymer science and technology in the following fields:Please kindly click here for the details of the scope list.
・E0. Plenary Talk
・E1. Next Generation Lithography and EB Lithography
・E2. EUV Lithography
・E3. DUV Lithography
・E4. Computational / Analytical Approach for Lithography Processes
・E5. Directed Self Assembly (DSA)
・E6. Nanoimprint
・E7. Strategies, Materials, and Processes for Advanced Packaging, MEMS, and Flexible Devices
・E8. Polyimides and High Thermally Stable Resins
・E9. Nanobiotechnology
・E10. Photopolymers in 3-D Printing/ Additive Manufacturing
・E11. Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices
・E12. Fundamentals and Applications of Biomimetics Materials and Processes
・E13, J1. Surface Treatment and Functionalization of Polymer Surfaces
・E14. Chemistry for Advanced Photopolymer Science
・P. Panel Symposium
・T. Tutorial Session
Registration
Registration Period: will be announced soon.All the participants, including speakers, are requested to register. The membership fees below include ICPST-43 participation and its journal (electronic file).
Early Bird By May 31, 2026 (11:59pm JST) |
General
From June 01, 2026 (00:00am JST) | |
|---|---|---|
| Regular | 65,000 JPY |
80,000 JPY |
| Student | 10,000 JPY |
15,000 JPY |
| Banquet (Optional) | 5,000 JPY | |
Manuscripts Submission
Papers submitted to ICPST-43 are published in Journal of Photopolymer Science and Technology, Vol. 39 (2026) after reviewing on the Journal's standard. Journal will be distributed to each participant during the conference. Submit the manuscripts though the link below before April 1, 2026 (11:59 JST).Those who have registered for ICPST will be able to access the electronic files of the papers. Participants will be notified of the access instructions by email. Please note that printed copies of the papers will no longer be distributed during the conference.
Details regarding manuscript submission, please click the button below for your reference.