ICPST Scope

E0. Plenary Talk

Symposium Chairs:
Takeo WATANABE (University of Hyogo), Teruaki HAYAKAWA (Institute of Science Tokyo), and Seiji NAGAHARA (ASML Japan)

Plenary Talk Speaker: TBD

E1. Next Generation Lithography and EB Lithography
-Advanced Patterning Technologies, Advanced Resist, Novel Patterning Technologies, EB Lithography, EB Resist, Direct Write Lithography-

Symposium Chairs:
Masayuki ENDO (E Litho Research), and Akinori SHIBUYA (FUJIFILM)

E2. EUV Lithography

Symposium Chairs:
Takeo WATANABE (University of Hyogo), Hiroto KUDO (Kansai University), Yoshio KAWAI (Shin-Etsu Chemical), Taku HIRAYAMA (HOYA), Shinji YAMAKAWA (University of Hyogo), Sosuke OSAWA (JSR), Ethan Choong Bong (CB) Lee (Samsung SDI), and Wang YUEH (Qnity)

E3. DUV Lithography
- KrF, ArF, ArFi, Laser Direct Writing

Symposium Chairs:
Yoshio KAWAI (Shin-Etsu Chemical), and Seiji NAGAHARA (ASML Japan)

E4. Computational / Analytical Approach for Lithography Processes

Symposium Chairs:
Kenji YOSHIMOTO (Kanazawa University), and Sosuke OSAWA (JSR)

E5. Directed Self Assembly (DSA)
- Self-Assembly Materials and Processes (DSA, BCP, SAM, ASD, Infiltration, Nanostructured Materials, Advanced Devices using Self Assembly, etc.)

Symposium Chairs:
Teruaki HAYAKAWA (Institute of Science Tokyo), Takehiro SESHIMO (Tokyo Ohka Kogyo), Dustin W. JANES (TEL Technology Center, America), Seiji NAGAHARA (ASML Japan), and Wang YUEH (Qnity)

E6. Nanoimprint

Symposium Chairs:
Yoshihiko HIRAI (Osaka Metropolitan University), Jun TANIGUCHI (Tokyo University of Science), Satoshi TAKEI (Toyama Prefectural University), and Kazuma KURIHARA (AIST)

E7. Strategies, Materials, and Processes for Advanced Packaging, MEMS, and Flexible Devices
-RDL, PDI: Photosensitive dielectric materials, WLP, PLP, Packaging Architectures, High Density Interconnects, Bonding Strategies, Co-Packaged Optics Integration, Substrates, Encapsulant, Flexible devices, sensors

Symposium Chairs:
Takumi Ueno (Shinshu University), Sanjay Malik (Screen SEC), Kuniharu Takei (Hokkaido University), and Hitoshi Araki (Toray)

E8. Polyimides and High Thermally Stable Resins

Symposium Chairs:
Teruaki HAYAKAWA (Institute of Science Tokyo) and Hitoshi ARAKI (Toray)

E9. Nanobiotechnology

Symposium Chairs:
Takanori ICHIKI (The University of Tokyo), Kensuke OSADA (National Institutes for Quantum Science and Technology)

E10. Photopolymers in 3-D Printing/ Additive Manufacturing
- Materials, processes, and related technologies for 3D printing and additive manufacturing
(including diverse materials, major AM processes, design such as Vat polymerization and Material extrusion, monitoring, and post-processing)

Symposium Chairs:
Masaru MUKAI (Tokyo University of Science) , Shoji MARUO (Yokohama National University) and Takumi UENO (Shinshu University)

E11. Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices

Symposium Chairs:
Itaru OSAKA (Hiroshima University) and Hideo OHKITA (Kyoto University)

E12. Fundamentals and Applications of Biomimetics Materials and Processes

Symposium Chairs:
Hiroyuki MAYAMA (Asahikawa Medical University), Atsushi SEKIGUCHI (Lithotech Japan), and Takayuki MUROSAKI (Asahikawa Medical University)

E13, J1. Surface treatment
- Functionalization of polymer surfaces, Plasma treatment, Photofunctional materials, Photoresist for surface modification　

Symposium Chairs:
Shin-ichi KONDO (Gifu Pharmaceutical University), Masashi YAMAMOTO (National Institute of Technology, Kagawa College, KIT), and Hideo HORIBE (Osaka Metropolitan University)

E14. Chemistry for Advanced Photopolymer Science

Symposium Chairs:
Haruyuki OKAMURA (Osaka Metropolitan University) and Teruaki HAYAKAWA (Institute of Science Tokyo)

P. Panel Symposium
Topics: “Unraveling the Chemistry of EUV Exposure: Mechanisms, Challenges, and Breakthroughs for Future EUV Lithography”

Facilitators:
Seiji NAGAHARA (ASML Japan), Takeo WATANABE (University of Hyogo)

T. Tutorial Session
Basics & Beyond: EUV Mechanisms | PFAS Free Sustainability | 3D Integration

Tutorial Session Organizers:
Seiji NAGAHARA (ASML Japan), and Haruyuki OKAMURA (Osaka Metropolitan University)
*The first person in Symposium Chairs will serve as Chief of each Symposium.

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