Panel Discussion

Prof. Robert Brainard received his B.S. in Chemistry from U.C. Berkeley and a Ph.D. in Chemistry while working with Professor G. Whitesides at MIT and Harvard University. Following his post-doctoral studies with Professor R. Madix at Stanford University, he worked for Polaroid and Shipley/RHEM in the areas of: DUV, EUV and E-Beam Photoresists. Prof. Brainard is now a Professor at University at Albany studying: EUV photoresist exposure mechanisms; High quantum efficiency EUV photoresists; Acid amplifiers for use in EUV Lithography; Design and synthesis of photo-imageable hydrogels for cell growth; Molecular Organometallic Resists for EUV (MORE).

John S. Petersen, Scientific Director of Lithography at imec and co-lead of AttoLab, has over 46 years of semiconductor experience spanning optical and EUV lithography, super‑resolution, and holography. An SPIE and former SEMATECH Fellow, he has 100+ publications, 13 patents, and serves as Adjunct Professor at the University of Maryland. His work advances actinic inspection, EUV photon–resist physics, and next‑generation patterning. ORCID: 0000‑0003‑4815‑3770

Patrick Naulleau received his B.S. and M.S. degrees in electrical engineering from the Rochester Institute of Technology, Rochester, NY, in 1991 and 1993, respectively. He received his Ph.D. in electrical engineering from the University of Michigan, Ann Arbor in 1997 specializing in optical signal processing and coherence theory. In 1997 Dr. Naulleau joined Berkeley Lab on the EUV LLC program building the world’s first EUV scanner. From June 2005 through March 2008, Dr. Naulleau additionally joined the faculty at the University at Albany, SUNY as Associate Professor, also concentrating in the area of EUV lithography. In April 2010 Dr. Naulleau took the position of Director of the Center for X-ray Optic at Lawrence Berkeley National Laboratory establishing and running their world-leading EUV high-NA lithography/metrology research facility through 2022. In August 2022, Dr. Naulleau assumed the role of CEO at EUV Tech Inc., a leading supplier of EUV metrology equipment. Dr. Naulleau has over 400 publications as well as 20 Patents and is a Fellow of SPIE and Optica.