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ICPST-43 (2026)
Panel Discussion
The panel discussion theme： “Chemistry of EUV Exposure Mechanisms”.
What is important in EUV mechanisms?What is exciting to investigate from now?
What can be a topic for ICPST attendees to work for in the EUV mechanism understanding ?
Free discussion with audience will be the main part of panel discussion this year.
General Information
Date: June 24 (Wed.), 2026Time: 18:30 - 20:00
Venue: Room A (Arcrea Himeji, Medium Hall)
PANELISTS: 1.5 hours session
Prof. Robert Brainard
State University of New York
USA
Biography
Prof. Robert Brainard received his B.S. in Chemistry from U.C. Berkeley and a Ph.D. in Chemistry while working with Professor G. Whitesides at MIT and Harvard University. Following his post-doctoral studies with Professor R. Madix at Stanford University, he worked for Polaroid and Shipley/RHEM in the areas of: DUV, EUV and E-Beam Photoresists. Prof. Brainard is now a Professor at University at Albany studying: EUV photoresist exposure mechanisms; High quantum efficiency EUV photoresists; Acid amplifiers for use in EUV Lithography; Design and synthesis of photo-imageable hydrogels for cell growth; Molecular Organometallic Resists for EUV (MORE).
Prof. Gregory Denbeaux
University at Albany
USA
Biography
Greg Denbeaux received his BA degree in physics from Wesleyan University in 1993. He studied free electron lasers and x-ray microscopy for his PhD from Duke University in 1999. He was a staff scientist at Lawrence Berkeley National Laboratory until becoming faculty at the College of Nanoscale Science and Engineering, Albany, New York. Currently, he is an associate professor at University at Albany and studies fundamentals of photoresists including stochastic effects, outgassing, and secondary electron interactions. He also has a research program in nanoparticle detection, quantification, identification and transport, all aimed at defectivity reduction in semiconductor manufacturing. He has published over 200 papers on this research which have been cited over 2,500 times. He has organized the IEUVI Resist Technical Working Group (TWG) for the last few years.
Prof. John Petersen
imec
Belgium
Biography
John S. Petersen, Scientific Director of Lithography at imec and co-lead of AttoLab, has over 46 years of semiconductor experience spanning optical and EUV lithography, super‑resolution, and holography. An SPIE and former SEMATECH Fellow, he has 100+ publications, 13 patents, and serves as Adjunct Professor at the University of Maryland. His work advances actinic inspection, EUV photon–resist physics, and next‑generation patterning. ORCID: 0000‑0003‑4815‑3770
Dr. Patrick Naulleau
EUV Tech
United States of America
Biography
Patrick Naulleau received his B.S. and M.S. degrees in electrical engineering from the Rochester Institute of Technology, Rochester, NY, in 1991 and 1993, respectively. He received his Ph.D. in electrical engineering from the University of Michigan, Ann Arbor in 1997 specializing in optical signal processing and coherence theory. In 1997 Dr. Naulleau joined Berkeley Lab on the EUV LLC program building the world’s first EUV scanner. From June 2005 through March 2008, Dr. Naulleau additionally joined the faculty at the University at Albany, SUNY as Associate Professor, also concentrating in the area of EUV lithography. In April 2010 Dr. Naulleau took the position of Director of the Center for X-ray Optic at Lawrence Berkeley National Laboratory establishing and running their world-leading EUV high-NA lithography/metrology research facility through 2022. In August 2022, Dr. Naulleau assumed the role of CEO at EUV Tech Inc., a leading supplier of EUV metrology equipment. Dr. Naulleau has over 400 publications as well as 20 Patents and is a Fellow of SPIE and Optica.
Dr. Danilo De Simone
IMEC
Belgium
Biography
Danilo De Simone is a Scientific Director at imec with 26 years of experience in semiconductor R&D and over 180 publications in advanced patterning. He previously worked at STMicroelectronics, Numonyx, and Micron, and serves on the editorial board of the Journal of Micro/Nanopatterning, Materials, and Metrology as well as on advisory boards for SPIE and Photopolymer Science and Technology conferences.
Prof. Takahiro Kozawa
The University of Osaka
Japan
Biography
Takahiro Kozawa is a professor of SANKEN, The University of Osaka. He earned his BS and MS degrees in nuclear engineering from the University of Tokyo, and Ph. D. degree in chemical engineering from Osaka University in 1990, 1992, and 2003, respectively. His work is mainly focused on beam-material interaction and beam-induced reactions in resist materials.
Prof. Kenji Yoshimoto
Kanazawa University
Japan
Biography
Kenji Yoshimoto is an Associate Professor at Kanazawa University, Japan. His research focuses on multiscale computational modeling of polymeric materials and manufacturing processes, including size-dependent resist properties, pattern collapse, block copolymer self-assembly, and stochastic processes in extreme ultraviolet lithography (EUVL). He received his Ph.D. in Chemical Engineering from the University of Wisconsin–Madison and has worked in both academia and industry, including at AMD and GlobalFoundries. His current work combines molecular simulation, stochastic modeling, and continuum approaches to understand nanoscale phenomena in next-generation lithography materials and processes.
Symposium organizers
Prof. Takeo WATANABE
University of Hyogo
Japan
Biography
Takeo Watanabe received his Ph.D. from Osaka City University in 1990. He is now Project Professor of the Next Generation EUVL Research Endowed Chair, Laboratory of Advanced Science and Technology for Industry, University of Hyogo.
He has been in the field of EUV Lithography since 1993. He is an expert of the EUV lithographic technology, including optics, exposure tool, mask and resist related technologies. He has many patents and authored over 280 scientific and technical papers,
He is the President of the International Conference of Photopolymer Science and Technology (ICPST). He is also Conference Chair of the International Conference of Photomask Japan (PMJ). And he is a program committee member of the International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN). Furthermore, he is a committee member of lithography of International Roadmap Devices and System (IRDS).
He received the Executive Science Award from Hyogo Prefecture, Japan, on Dec. 19, 2024.
Prof. Seiji NAGAHARA
ASML Japan
Japan
Biography
Seiji Nagahara serves as Vice President and Board Member of the Society of Photopolymer Science and Technology (SPST). Currently, he is Head of Technical Marketing at ASML Japan. Previously, he held key roles at Tokyo Electron Ltd. (TEL), Renesas Electronics and NEC, focusing on next-generation lithography and tool/process development. His career includes collaborative research with institutions like Toshiba, IMEC in Belgium, UC Berkeley, Argonne National Laboratory, and EIDEC. He holds a Bachelor's, Master's, and Ph.D. degrees in Engineering from Osaka University, Japan. He is SPIE Fellow and also holds positions in several academic and technical societies.
Prof. Shinji YAMAKAWA
University of Hyogo
Japan
Biography
Shinji Yamakawa received his Bachelor's and Master's degrees in chemistry from Kansai University, Japan, in 2014 and 2016, and his Ph.D. (Eng.) degree from Tokyo Institute of Technology, Japan, in 2019. He was a specially appointed assistant professor at Tokyo Institute of Technology from 2019 to 2020. In 2020, He joined the Laboratory of Advanced Science and Technology for Industry (LASTI) of University of Hyogo as an assistant professor. Since Oct. 2024, he has been an associate professor. He has been awarded The Photopolymer Science and Technology Award: Best Paper Award in 2023. His current research interests are the synthesis of photoresists for next-generation lithography and the reaction mechanism analysis of EUV resist under EUV irradiation. He has been the SPST director of publication since Jan. 2025.