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ICPST-43 (2026)
Program List
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Plenary Session
Date
June 24 (Wed.), 2026 10:00 - 11:30
Room
Room A (Medium Hall)(Arcrea Himeji, Medium Hall)
Chairperson
Takeo Watanabe(University of Hyogo)
Nagahara Seiji(ASML JAPAN)
PL-1
Patterning Materials for Lithography: Moving in New Directions
Time: 10:45 - 11:30
PL-1
Patterning Materials for Lithography: Moving in New Directions
Time: 10:45 - 11:30
Speaker
Harry Levinson(HJL Lithography)
PL-2
Patterning opportunity for devices in the future of computing
Time: 10:00 - 10:45
PL-2
Patterning opportunity for devices in the future of computing
Time: 10:00 - 10:45
Speaker
Hiroyuki Miyazoe(IBM)
Tutorial Session
EUV Mechanisms | PFAS Free Sustainability | 3D Integration
EUV Mechanisms | PFAS Free Sustainability | 3D Integration
Details
Date
June 23 (Tue.), 2026 13:00 - 14:40
Room
Room A (Medium Hall)(Arcrea Himeji, Medium Hall)
Chairperson
Nagahara Seiji(ASML JAPAN)
Haruyuki Okamura(Osaka Metropolitan University)
T-1
Introduction to EUV Lithography
Time: 13:10 -14:40
T-1
Introduction to EUV Lithography
Time: 13:10 -14:40
Speaker
Harry Levinson(HJL Lithography)
Tutorial Session
EUV Mechanisms | PFAS Free Sustainability | 3D Integration
EUV Mechanisms | PFAS Free Sustainability | 3D Integration
Details
Date
June 23 (Tue.), 2026 14:55 - 16:25
Room
Room A (Medium Hall)(Arcrea Himeji, Medium Hall)
Chairperson
Takeo Watanabe(University of Hyogo)
Taku HIRAYAMA(HOYA)
T-2
The Physics of the Exposure of Photoresists to Extreme Ultraviolet (EUV, 13.5 nm) Light (From the Perspective of a Chemist)
Time: 14:55 - 15:25
T-2
The Physics of the Exposure of Photoresists to Extreme Ultraviolet (EUV, 13.5 nm) Light (From the Perspective of a Chemist)
Time: 14:55 - 15:25
Speaker
Robert Brainard(University at Albany)
T-3
Using Resist Lithographic Responses to Map the Projected Image for Material Evaluation and Process Design
Time: 15:55 - 16:25
T-3
Using Resist Lithographic Responses to Map the Projected Image for Material Evaluation and Process Design
Time: 15:55 - 16:25
Speaker
John Petersen(imec，University of Maryland, College Park)
T-4
Addressing Sustainability Challenges in PFAS Regulation
Time: 15:55 - 16:25
T-4
Addressing Sustainability Challenges in PFAS Regulation
Time: 15:55 - 16:25
Speaker
Tomohide Katayama(Merck)
Tutorial Session
EUV Mechanisms | PFAS Free Sustainability | 3D Integration
EUV Mechanisms | PFAS Free Sustainability | 3D Integration
Details
Date
June 23 (Tue.), 2026 16:40 - 18:20
Room
Room A (Medium Hall)(Arcrea Himeji, Medium Hall)
Chairperson
Sanjay Malik(SCREEN SPE)
Takumi Ueno(Shinshu University)
T-5
Why Are Photosensitive/Non-Photosensitive Polymers Important in Advanced Semiconductor Packaging?
Time: 16:40 - 17:20
T-5
Why Are Photosensitive/Non-Photosensitive Polymers Important in Advanced Semiconductor Packaging?
Time: 16:40 - 17:20
Speaker
Takafumi Fukushima(Tohoku University)
T-6
Advanced Packaging Materials and Co-Creative Evaluation Platforms at Resonac
Time: 17:20 -17:50
T-6
Advanced Packaging Materials and Co-Creative Evaluation Platforms at Resonac
Time: 17:20 -17:50
Speaker
Sadaaki Katoh(Resonac Corporation)
T-7
Photopolymers Enabling Fine-Pitch Cu RDL Damascene: Materials, Process, and Integration
Time: 17:50 - 18:20
T-7
Photopolymers Enabling Fine-Pitch Cu RDL Damascene: Materials, Process, and Integration
Time: 17:50 - 18:20
Speaker
TOSHIYUKI OGATA(TAIYO HOLDINGS CO., LTD.)
E1. Next Generation Lithography and EB Lithography
Date
June 25 (Thu.), 2026 15:15 - 16:15
Room
Room A (Medium Hall)(Arcrea Himeji, Medium Hall)
Chairperson
Yoshio Kawai (Shin-Etsu Chemical)
Nagahara Seiji(ASML JAPAN)
E1-1-1
Improvements of Applying RAFT Polymerization in High-performance Photoresist Manufacture
Time: 15:15 - 15:35
E1-1-1
Improvements of Applying RAFT Polymerization in High-performance Photoresist Manufacture
Time: 15:15 - 15:35
Speaker
Xiang Dong(Xuzhou B&C Chemical Technology Co.,Ltd.)
E1-1-2
An Efficient Approach to Compare Acid Diffusive Ability in DUV Resist Using Open Frame Exposure
Time: 15:35 - 15:55
E1-1-2
An Efficient Approach to Compare Acid Diffusive Ability in DUV Resist Using Open Frame Exposure
Time: 15:35 - 15:55
Speaker
Ruiwen Ai(Xuzhou B&C Chemical Technology Co.,Ltd)
E1-1-3
Development and optimization of new bio-sourced resist for lithography applications.
Time: 15:55 - 16:15
E1-1-3
Development and optimization of new bio-sourced resist for lithography applications.
Time: 15:55 - 16:15
Speaker
Jeanne Aigoin(Université Grenoble Alpes, CEA, LETI)
E2. EUV Lithography
Date
June 24 (Wed.), 2026 13:00 - 14:40
Room
Room A (Medium Hall)(Arcrea Himeji, Medium Hall)
Chairperson
Takeo Watanabe(University of Hyogo)
Robert Brainard(University at Albany)
E2-1-1(Keynote)
Engineering the Future of EUV: A Collaborative Journey in Metal-Oxide Resist Innovation
Time: 13:00 - 13:40
E2-1-1(Keynote)
Engineering the Future of EUV: A Collaborative Journey in Metal-Oxide Resist Innovation
Time: 13:00 - 13:40
Speaker
Danilo De Simone(IMEC)
E2-1-2
Comprehensive Approach of Advanced Patterning Materials and Innovation toward Next Generation Device Architecture
Time: 13:40 - 14:10
E2-1-2
Comprehensive Approach of Advanced Patterning Materials and Innovation toward Next Generation Device Architecture
Time: 13:40 - 14:10
Speaker
Ethan CB Lee(Samsung SDI)
E2-1-3
EUV-FEL as a future light source for advanced lithography (II)
Time: 14:10 - 14:40
E2-1-3
EUV-FEL as a future light source for advanced lithography (II)
Time: 14:10 - 14:40
Speaker
Hiroshi KAWATA(High Energy Accelerator Research Organization (KEK))
E2. EUV Lithography
Date
June 24 (Wed.), 2026 14:55 - 15:35
Room
Room A (Medium Hall)(Arcrea Himeji, Medium Hall)
Chairperson
Taku HIRAYAMA(HOYA)
Danilo De Simone(IMEC)
E2-2-1
Halogenated Triphenyl Amine Additives as Sensitizers for PFAS-free Chemically-Amplified Resists
Time: 14:55 - 15:15
E2-2-1
Halogenated Triphenyl Amine Additives as Sensitizers for PFAS-free Chemically-Amplified Resists
Time: 14:55 - 15:15
Speaker
Fabian Holzmeier(imec)
E2-2-2
Improvement of non-PFAS biomass EUV resist by optimization of chemical structures
Time: 15:15 - 15:35
E2-2-2
Improvement of non-PFAS biomass EUV resist by optimization of chemical structures
Time: 15:15 - 15:35
Speaker
Sotaro Fukumoto(OJI Holdings Corporation)
E2. EUV Lithography
Date
June 25 (Thu.), 2026 09:30 - 11:30
Room
Room A (Medium Hall)(Arcrea Himeji, Medium Hall)
Chairperson
Sousuke Oosawa(JSR)
John Petersen(imec)
E2-3-1
Negative-tone Molecular Resist for High-resolution EUV Lithography
Time: 9:30 - 9:50
E2-3-1
Negative-tone Molecular Resist for High-resolution EUV Lithography
Time: 9:30 - 9:50
Speaker
Takahiro Maruyama(Merck Electronics Ltd.)
E2-3-2
Effect of Organic Ligand Structure on Resist Performance of Inorganic-Organic Hybrid Resist Materials for EB and EUV Lithography
Time: 9:50 - 10:20
E2-3-2
Effect of Organic Ligand Structure on Resist Performance of Inorganic-Organic Hybrid Resist Materials for EB and EUV Lithography
Time: 9:50 - 10:20
Speaker
Hiroki Yamamoto(National Institutes for Quantum Science and Technology (QST))
E2-3-3
Modeling of Tin based MOR Resists
Time: 10:20 - 10:50
E2-3-3
Modeling of Tin based MOR Resists
Time: 10:20 - 10:50
Speaker
Mark Neisser(Tsinghua University，International Innovation Center of Tsinghua University, Shanghai)
E2-3-4
Ligand-Dependent Performance in Negative-Tone Organotin EUV Resists
Time: 10:50 - 11:10
E2-3-4
Ligand-Dependent Performance in Negative-Tone Organotin EUV Resists
Time: 10:50 - 11:10
Speaker
Robert Brainard(University at Albany)
E2-3-5
Bismuth Complexes for EUV and E-Beam Lithography
Time: 11:10 - 11:30
E2-3-5
Bismuth Complexes for EUV and E-Beam Lithography
Time: 11:10 - 11:30
Speaker
Robert Brainard(University at Albany)
E2. EUV Lithography
Date
June 25 (Thu.), 2026 13:00 - 15:00
Room
Room A (Medium Hall)(Arcrea Himeji, Medium Hall)
Chairperson
Shinji Yamakawa(University of Hyogo)
Cheng Wang(Lawrence Berkeley National Laboratory )
E2-4-1
Vertical-Molecular-Wire EUV Dry Resist for 1.5 nm Technology Node
Time: 13:00 - 13:30
E2-4-1
Vertical-Molecular-Wire EUV Dry Resist for 1.5 nm Technology Node
Time: 13:00 - 13:30
Speaker
Myung Mo Sung(Hanyang University)
E2-4-2
Moisture-Induced Sensitivity Changes in a High-Resolution Zinc Oximate EUV Resist under Post-Exposure Delay
Time: 13:30 - 13:50
E2-4-2
Moisture-Induced Sensitivity Changes in a High-Resolution Zinc Oximate EUV Resist under Post-Exposure Delay
Time: 13:30 - 13:50
Speaker
Ying-Lin Chen(imec，KU Leuven)
E2-4-3
Recent development of new rinse materials beneficial for pattern collapse mitigation in EUV lithography
Time: 13:50 - 14:10
E2-4-3
Recent development of new rinse materials beneficial for pattern collapse mitigation in EUV lithography
Time: 13:50 - 14:10
Speaker
Takuo Endo(Merck Electronics Ltd.)
E2-4-4
Influence of Underlayer Material Parameters on Pattern Collapse in EUV Patterning
Time: 14:10 - 14:30
E2-4-4
Influence of Underlayer Material Parameters on Pattern Collapse in EUV Patterning
Time: 14:10 - 14:30
Speaker
Hyeon Woo Shin(Qnity Electronics, Inc. )
E2-4-5
A Quantitative Framework for Projected‑Image Reconstruction Using Resist Contrast, Iso‑Focal Response, and NILS Applied to Advanced Photoresist Evaluation
Time: 14:30 - 15:00
E2-4-5
A Quantitative Framework for Projected‑Image Reconstruction Using Resist Contrast, Iso‑Focal Response, and NILS Applied to Advanced Photoresist Evaluation
Time: 14:30 - 15:00
Speaker
John Petersen(imec，University of Maryland，College Park)
E2. EUV Lithography
Date
June 26 (Fri.), 2026 13:00 - 14:50
Room
Room A (Medium Hall)(Arcrea Himeji, Medium Hall)
Chairperson
Takeo Watanabe(University of Hyogo)
Mark Neisser(Tsinghua University)
E2-5-1
CD-RSoXS: Chemically Sensitive 3D Metrology of EUV Latent Images and Lithographic Materials.
Time: 13:00 - 13:30
E2-5-1
CD-RSoXS: Chemically Sensitive 3D Metrology of EUV Latent Images and Lithographic Materials.
Time: 13:00 - 13:30
Speaker
Cheng Wang(Lawrence Berkeley National Laboratory)
E2-5-2
Latent image visualization by laser-based photoemission electron microscopy
Time: 13:30 - 14:30
E2-5-2
Latent image visualization by laser-based photoemission electron microscopy
Time: 13:30 - 14:30
Speaker
Hirokazu Fujiwara(The University of Tokyo)
E2-5-3
Computational Modeling of Ionic Electrostatic Interactions and Lithographic Outcomes in EUV Photoresists
Time: 14:30 - 14:50
E2-5-3
Computational Modeling of Ionic Electrostatic Interactions and Lithographic Outcomes in EUV Photoresists
Time: 14:30 - 14:50
Speaker
Geun Seok Lee(Qnity Electronics, Inc.)
E2. EUV Lithography
Date
June 26 (Fri.), 2026 15:05 - 16:45
Room
Room A (Medium Hall)(Arcrea Himeji, Medium Hall)
Chairperson
Yoshio Kawai (Shin-Etsu Chemical)
Ethan CB Lee(Samsung SDI)
E2-6-1
Evaluation of Resist-Process-Induced Aggregation by RSoXS
Time: 15:05 - 15:25
E2-6-1
Evaluation of Resist-Process-Induced Aggregation by RSoXS
Time: 15:05 - 15:25
Speaker
Ayumu Tanaka(University of Hyogo)
E2-6-2
NP-SIMS for examining the effect of exposure on hybrid resists
Time: 15:25 - 15:45
E2-6-2
NP-SIMS for examining the effect of exposure on hybrid resists
Time: 15:25 - 15:45
Speaker
Michael Eller(University of Mississippi)
E2-6-3
Effect of Residual Solvent on Exposure Sensitivity under EUV and Low-Energy Electron Irradiation in PHS-Boc Resists
Time: 15:45 - 16:05
E2-6-3
Effect of Residual Solvent on Exposure Sensitivity under EUV and Low-Energy Electron Irradiation in PHS-Boc Resists
Time: 15:45 - 16:05
Speaker
Kuramoto Kouji(KH Neochem)
E2-6-4
Investigation of Resist Development under Electron-Beam Irradiation below 400 eV for Short-Wavelength EUV
Time: 16:05 - 16:25
E2-6-4
Investigation of Resist Development under Electron-Beam Irradiation below 400 eV for Short-Wavelength EUV
Time: 16:05 - 16:25
Speaker
Ryuichi Yamasaki(University of Hyogo)
E2-6-5
Resist Sensitivity Evaluation towards Short-Wavelength EUV Lithography at NewSUBARU
Time: 16:25 - 16:45
E2-6-5
Resist Sensitivity Evaluation towards Short-Wavelength EUV Lithography at NewSUBARU
Time: 16:25 - 16:45
Speaker
Takanari Nishida(University of Hyogo)
E3. DUV Lithography
Date
June 25 (Thu.), 2026 16:15 - 17:05
Room
Room A (Medium Hall)(Arcrea Himeji, Medium Hall)
Chairperson
Masayuki Endo(E Litho Research)
Akinori Shibuya(FUJIFILM)
E3-1-1
Progress and Recent Topics of Speckle Lithography
Time: 16:15 - 16:45
E3-1-1
Progress and Recent Topics of Speckle Lithography
Time: 16:15 - 16:45
Speaker
Toshiyuki Horiuchi(Tokyo Denki University)
E3-1-2
Challenges and progress of PFAS alternatives for ArF resist
Time: 16:45 - 17:05
E3-1-2
Challenges and progress of PFAS alternatives for ArF resist
Time: 16:45 - 17:05
Speaker
Ryosuke Kato(FUJIFILM Corporation)
E4. Computational / Analytical Approach for Lithography Processes
Date
June 24 (Wed.), 2026 16:10 - 18:10
Room
Room A (Medium Hall)(Arcrea Himeji, Medium Hall)
Chairperson
Kenji Yoshimoto(Kanazawa University)
Takahiro Kozawa(SANKEN, The University of Osaka)
E4-1-1
Advances in control models for scanner corrections of process errors
Time: 16:10 - 16:40
E4-1-1
Advances in control models for scanner corrections of process errors
Time: 16:10 - 16:40
Speaker
Wim Tel(ASML)
E4-1-2
AI-Driven EDA: Opening a New Era in Semiconductor Design & Manufacturing
Time: 16:40 - 17:10
E4-1-2
AI-Driven EDA: Opening a New Era in Semiconductor Design & Manufacturing
Time: 16:40 - 17:10
Speaker
Kazuyuki Yorogo(Siemens Electronic Design Automation Japan K.K.)
E4-1-3
Dissolution Kinetics of Poly(4-hydroxystyrene) Film in Alcohol/water Mixture
-Development Simulation of Polymer Films Using Intrinsic Viscosity and Huggins Coefficient-
-Development Simulation of Polymer Films Using Intrinsic Viscosity and Huggins Coefficient-
Time: 17:10 - 17:30
E4-1-3
Dissolution Kinetics of Poly(4-hydroxystyrene) Film in Alcohol/water Mixture
-Development Simulation of Polymer Films Using Intrinsic Viscosity and Huggins Coefficient-
-Development Simulation of Polymer Films Using Intrinsic Viscosity and Huggins Coefficient-
Time: 17:10 - 17:30
Speaker
Takahiro Kozawa(SANKEN, The University of Osaka)
E4-1-4
Probabilistic Numerical Modeling of Component Fluctuations in Chemically Amplified EUV Resists
Time: 17:30 - 17:50
E4-1-4
Probabilistic Numerical Modeling of Component Fluctuations in Chemically Amplified EUV Resists
Time: 17:30 - 17:50
Speaker
Soma Tachibana(Kanazawa University)
E4-1-5
Fast Stochastic Prediction in Chemically Amplified EUV Resists via Linear Noise Approximation
Time: 17:50 - 18:10
E4-1-5
Fast Stochastic Prediction in Chemically Amplified EUV Resists via Linear Noise Approximation
Time: 17:50 - 18:10
Speaker
Kenji Yoshimoto(Kanazawa University)
E5. Directed Self Assembly (DSA)
Date
June 25 (Thu.), 2026 16:30 - 17:10
Room
Room C (Room 407)(Arcrea Himeji, Room 407)
Chairperson
Dustin Janes(TEL)
Nagahara Seiji(ASML JAPAN)
Wang Yueh(Qnity)
E5-1-1
Molecular Aggregates Capable of Sufficient Disassembly and Reassembly in Response to Light Wavelengths
Time: 16:30 - 16:50
E5-1-1
Molecular Aggregates Capable of Sufficient Disassembly and Reassembly in Response to Light Wavelengths
Time: 16:30 - 16:50
Speaker
Mina Han(Kongju National University)
E5-1-2
Linker Length Dependent Photoswitching and Self-Assembly in Azo-BODIPY Based Systems
Time: 16:50 - 17:10
E5-1-2
Linker Length Dependent Photoswitching and Self-Assembly in Azo-BODIPY Based Systems
Time: 16:50 - 17:10
Speaker
Jailenn Jannaraine Puray(Kongju National University)
E5. Directed Self Assembly (DSA)
Date
June 26 (Fri.), 2026 09:30 - 11:00
Room
Room A (Medium Hall)(Arcrea Himeji, Medium Hall)
Chairperson
Teruaki HAYAKAWA(Institute of Science Tokyo)
Takehiro SESHIMO(Tokyo Ohka Kogyo)
E5-2-1
Advances in Directed Self-Assembly Materials and Processes for Complementing EUV Lithography
Time: 9:30 - 10:00
E5-2-1
Advances in Directed Self-Assembly Materials and Processes for Complementing EUV Lithography
Time: 9:30 - 10:00
Speaker
Lander Verstraete(Imec, Belgium)
E5-2-2
Beyond PS‑b‑PMMA: Directed Self‑Assembly Enabling EUV Rectification with Novel High‑χ Block Copolymer for Highly Uniform Patterns
Time: 10:00 - 10:20
E5-2-2
Beyond PS‑b‑PMMA: Directed Self‑Assembly Enabling EUV Rectification with Novel High‑χ Block Copolymer for Highly Uniform Patterns
Time: 10:00 - 10:20
Speaker
Shinsuke Maekawa(Tokyo Ohka Kogyo Co., Ltd.)
E5-2-3
Precise Synthesis of Poly(2-vinylpyridine)-b-Poly(dimethylsiloxane) for the Development of Microphase-Separated Structures
Time: 10:20 - 10:40
E5-2-3
Precise Synthesis of Poly(2-vinylpyridine)-b-Poly(dimethylsiloxane) for the Development of Microphase-Separated Structures
Time: 10:20 - 10:40
Speaker
Riku Takahashi(Institute of Science Tokyo)
E5-2-4
Influence of Low Surface Free Energy Block Position on Microdomain Orientation in Triblock Copolymer Thin Films
Time: 10:40 - 11:00
E5-2-4
Influence of Low Surface Free Energy Block Position on Microdomain Orientation in Triblock Copolymer Thin Films
Time: 10:40 - 11:00
Speaker
Ryota Uehara(Institute of Science Tokyo)
E6. Nanoimprint
Date
June 26 (Fri.), 2026 09:30 - 10:30
Room
Room C (Room 407)(Arcrea Himeji, Room 407)
Chairperson
Jun Taniguchi(Tokyo University of Science)
E6-1-1
Hydroxypropyl Methylcellulose-Based pH-Responsive Microneedle Sensor for Food Spoilage Detection
Time: 9:30 - 9:50
E6-1-1
Hydroxypropyl Methylcellulose-Based pH-Responsive Microneedle Sensor for Food Spoilage Detection
Time: 9:30 - 9:50
Speaker
Misaki Oshima(Toyama Prefectural University)
E6-1-2
Moth-eye nanostructured surface with patterned superhydrophilic regions on a superhydrophobic background
Time: 9:50 - 10:10
E6-1-2
Moth-eye nanostructured surface with patterned superhydrophilic regions on a superhydrophobic background
Time: 9:50 - 10:10
Speaker
Takuto Wakasa(Tokyo University of Science)
E6-1-3
Fabrication of ceramic micropatterns using solvent-soluble UV-curable resins
Time: 10:10 - 10:30
E6-1-3
Fabrication of ceramic micropatterns using solvent-soluble UV-curable resins
Time: 10:10 - 10:30
Speaker
Jun Taniguchi(Tokyo University of Science)
E7. Strategies, Materials, and Processes for Advanced Packaging, MEMS, and Flexible Devices
Date
June 25 (Thu.), 2026 09:20 - 11:25
Room
Room B (Small Hall)(Arcrea Himeji, Small Hall)
Chairperson
Takumi Ueno(Shinshu University)
Sanjay Malik(SCREEN SPE)
E7-1-1 (Invited)
Advanced Microelectronic Packaging Trends Using Photosensitive and Non-Photosensitive Polymers
Time: 9:20 - 9:50
E7-1-1 (Invited)
Advanced Microelectronic Packaging Trends Using Photosensitive and Non-Photosensitive Polymers
Time: 9:20 - 9:50
Speaker
Takafumi Fukushima(Tohoku University)
E7-1-2 (Keynote)
Advanced Packaging – 3D System on Chip Partitioning and Chiplets
Time: 9:50 - 10:35
E7-1-2 (Keynote)
Advanced Packaging – 3D System on Chip Partitioning and Chiplets
Time: 9:50 - 10:35
Speaker
Andy Miller(IMEC)
E7-1-3 (Invited)
Advanced materials for high performance semiconductor packages
Time: 10:35 - 11:05
E7-1-3 (Invited)
Advanced materials for high performance semiconductor packages
Time: 10:35 - 11:05
Speaker
Takao Sakuma(Ajinomoto Co., Inc.)
E7-1-5
<1 micron Lines and Vias in Polymer Dielectrics Using Novel Photodefinable Hardmask
Time: 11:05 - 11:25
E7-1-5
<1 micron Lines and Vias in Polymer Dielectrics Using Novel Photodefinable Hardmask
Time: 11:05 - 11:25
Speaker
Yu Kambe(NanoPattern Technologies, Inc.)
E7. Strategies, Materials, and Processes for Advanced Packaging, MEMS, and Flexible Devices
Date
June 25 (Thu.), 2026 14:30 - 16:00
Room
Room B (Small Hall)(Arcrea Himeji, Small Hall)
Chairperson
Andy Miller(IMEC)
Tatsuya Makino(HDM)
E7-2-1 (Invited)
JOINT2: Advancing Package Evaluation — Development Progress and Technical Challenges
Time: 14:30 - 15:00
E7-2-1 (Invited)
JOINT2: Advancing Package Evaluation — Development Progress and Technical Challenges
Time: 14:30 - 15:00
Speaker
Sadaaki Katoh(Resonac Corporation)
E7-2-2
Novel photosensitive polyimide(PSPI) for next generation advanced packaging
Time: 15:00 -15:20
E7-2-2
Novel photosensitive polyimide(PSPI) for next generation advanced packaging
Time: 15:00 -15:20
Speaker
Takahiro Shimizu(TOKYO OHKA KOGYO CO., LTD.)
E7-2-3
Extreme Copper Wiring via Etch Control – A Simulation Study with Atomistic Resolution
Time: 15:20 - 15:40
E7-2-3
Extreme Copper Wiring via Etch Control – A Simulation Study with Atomistic Resolution
Time: 15:20 - 15:40
Speaker
Arsenios Gkourras(SCREEN SPE Germany GMBH)
E7-2-4
Development of reactive molecular dynamics for cross-linked polymer networks
Time: 15:40 - 16:00
E7-2-4
Development of reactive molecular dynamics for cross-linked polymer networks
Time: 15:40 - 16:00
Speaker
Minoru Hoshino(Resonac Corporation)
E7. Strategies, Materials, and Processes for Advanced Packaging, MEMS, and Flexible Devices
Date
June 25 (Thu.), 2026 16:10 - 17:20
Room
Room B (Small Hall)(Arcrea Himeji, Small Hall)
Chairperson
Hitoshi Araki(Toray)
Guillermo Fernadez(TSMC Japan)
E7-3-1 (Invited)
Reaction Layer Formation Mechanism at Transition Metal/Polyimide Interfaces: Correlation with Adhesion.
Time: 16:10 - 16:40
E7-3-1 (Invited)
Reaction Layer Formation Mechanism at Transition Metal/Polyimide Interfaces: Correlation with Adhesion.
Time: 16:10 - 16:40
Speaker
Yugo Kubo(Sumitomo Electric Industries, Ltd. )
E7-3-2
Development of Next-Generation Photoresist Materials for Advanced Semiconductor Packaging
Time: 16:40 - 17:00
E7-3-2
Development of Next-Generation Photoresist Materials for Advanced Semiconductor Packaging
Time: 16:40 - 17:00
Speaker
Kazuki Sato(TOKYO OHKA KOGYO CO., LTD.)
E7-3-3
High Aspect Ratio Cu Pillar Formation on 310 × 310 mm Panel Using Novel Dry Film Resists and Digital Lithography
Time: 17:00 - 17:20
E7-3-3
High Aspect Ratio Cu Pillar Formation on 310 × 310 mm Panel Using Novel Dry Film Resists and Digital Lithography
Time: 17:00 - 17:20
Speaker
Hajime Furutani(Asahikasei)
E8. Polyimides and High Thermally Stable Resins
Date
June 25 (Thu.), 2026 13:00 - 14:20
Room
Room B (Small Hall)(Arcrea Himeji, Small Hall)
Chairperson
Teruaki HAYAKAWA(Institute of Science Tokyo)
Hitoshi Araki(Toray)
E8-1-1
Molecular Design and Property Prediction of Sterically Confined Melt-Processable Phenylethynyl-Terminated Oligoimides for High-Temperature Fiber-Reinforced Plastics
Time: 13:00 - 13:20
E8-1-1
Molecular Design and Property Prediction of Sterically Confined Melt-Processable Phenylethynyl-Terminated Oligoimides for High-Temperature Fiber-Reinforced Plastics
Time: 13:00 - 13:20
Speaker
Jung Min Bae(Kyungpook National University)
E8-1-2
Water Vapor Permeability in Polyimide Materials during Hybrid Bonding
Time: 13:20 - 13:40
E8-1-2
Water Vapor Permeability in Polyimide Materials during Hybrid Bonding
Time: 13:20 - 13:40
Speaker
Kai Ishigami(Toray Industries, Inc.)
E8-1-3
Synthesis of Silicon-Containing Hydrocarbon-Based Polymers Exhibiting Low Dielectric Loss for High-Frequency Communication Applications
Time: 13:40 - 14:00
E8-1-3
Synthesis of Silicon-Containing Hydrocarbon-Based Polymers Exhibiting Low Dielectric Loss for High-Frequency Communication Applications
Time: 13:40 - 14:00
Speaker
YUKA AZUMA(Institute of Science Tokyo)
E8-1-4
Bulky Substituent Effects on High-Frequency Dielectric Properties of Poly(ether sulfone)s and Polyimides
Time: 14:00 - 14:20
E8-1-4
Bulky Substituent Effects on High-Frequency Dielectric Properties of Poly(ether sulfone)s and Polyimides
Time: 14:00 - 14:20
Speaker
Kentaro Sone(Institute of Science Tokyo)
E9. Nanobiotechnology
Date
June 26 (Fri.), 2026 09:30 - 12:00
Room
Room B (Small Hall)(Arcrea Himeji, Small Hall)
Chairperson
Kensuke Osada(NIQST)
Takanori Ichiki(Univ. of Tokyo)
E9-1-1
Programmable Biomembrane Nanoparticles for Functional Biointerfaces
Time: 9:30 - 10:00
E9-1-1
Programmable Biomembrane Nanoparticles for Functional Biointerfaces
Time: 9:30 - 10:00
Speaker
Yoshihiro Sasaki(Graduate School of Engineering, Kyoto University)
E9-1-2
Host‑Dependent Anti‑Metastatic Effects of Carbon-ion Radiation Therapy Combined with Dendritic Cell Immunotherapy
Time: 10:00 - 10:30
E9-1-2
Host‑Dependent Anti‑Metastatic Effects of Carbon-ion Radiation Therapy Combined with Dendritic Cell Immunotherapy
Time: 10:00 - 10:30
Speaker
Liqiu Ma(National Institutes for Quantum Science and Technology)
E9-1-3
Design of Peptide-Mimetic Bioactive Polymers Targeting Biomembranes
Time: 10:30 - 11:00
E9-1-3
Design of Peptide-Mimetic Bioactive Polymers Targeting Biomembranes
Time: 10:30 - 11:00
Speaker
Kazuma Yasuhara(Nara Institute of Science and Technology)
E9-1-4
Evaluation of microneedle devices for biosensor applications
Time: 11:00 - 11:30
E9-1-4
Evaluation of microneedle devices for biosensor applications
Time: 11:00 - 11:30
Speaker
Yukihiro Kanda(Innovation Center of NanoMedicine，The University of Tokyo)
E9-1-5
Engineering Injectable Hyaluronic acid Hydrogels with Tunable Dioxazaborocane Crosslinking enables and Immunostimulatory CpG Delivery
Time: 11:30 - 12:00
E9-1-5
Engineering Injectable Hyaluronic acid Hydrogels with Tunable Dioxazaborocane Crosslinking enables and Immunostimulatory CpG Delivery
Time: 11:30 - 12:00
Speaker
Debabrata Palai(Department of Organic Biomaterials, Institute of Science Tokyo，Joining and Welding Research Institute, The University of Osaka)
E10. Photopolymers in 3-D Printing/ Additive Manufacturing
Date
June 25 (Thu.), 2026 13:30 - 14:50
Room
Room C (Room 407)(Arcrea Himeji, Room 407)
Chairperson
Mukai Masaru(Tokyo University of Science)
Yukikazu Takeoka(Nagoya University)
E10-1-1
3D-Printable Composite Elastomers with Biocompatibility and Mechanical Properties Mimicking Soft Biological Tissues
Time: 13:30 - 14:00
E10-1-1
3D-Printable Composite Elastomers with Biocompatibility and Mechanical Properties Mimicking Soft Biological Tissues
Time: 13:30 - 14:00
Speaker
Yukikazu Takeoka(Nagoya University)
E10-1-2
Photothermally responsive hydrogel microrobots fabricated by multi-material two-photon lithography
Time: 14:00 - 14:20
E10-1-2
Photothermally responsive hydrogel microrobots fabricated by multi-material two-photon lithography
Time: 14:00 - 14:20
Speaker
Shusuke Iwano(Yokohama National University)
E10-1-3
Development of photo-crosslinkable, micropore-forming bioink for 3D-bioprinting of oriented muscle tissues
Time: 14:20 - 14:50
E10-1-3
Development of photo-crosslinkable, micropore-forming bioink for 3D-bioprinting of oriented muscle tissues
Time: 14:20 - 14:50
Speaker
Akihiro Nishiguchi(National Institute for Materials Science)
E10. Photopolymers in 3-D Printing/ Additive Manufacturing
Date
June 25 (Thu.), 2026 15:00 - 16:30
Room
Room C (Room 407)(Arcrea Himeji, Room 407)
Chairperson
Akihiro Nishiguchi(National Institute for Materials Science)
Maruo Shouji(Yokohama national univirsity)
E10-2-1
Recyclable anthracene-based photocurable resin for 3D sacrificial molds
Time: 15:00 - 15:20
E10-2-1
Recyclable anthracene-based photocurable resin for 3D sacrificial molds
Time: 15:00 - 15:20
Speaker
Tomomi Aoki(Yokohama National University)
E10-2-2
Laser-Based Fabrication of Proteinaceous Microstructures: Recent Advances and Challenges.
Time: 15:20 - 15:50
E10-2-2
Laser-Based Fabrication of Proteinaceous Microstructures: Recent Advances and Challenges.
Time: 15:20 - 15:50
Speaker
Daniela Serien(AIST)
E10-2-3
Low‑Dielectric, High‑Thermal‑Stability Poly(divinylbenzene) Structures Fabricated via Stereolithography
Time: 15:50 - 16:10
E10-2-3
Low‑Dielectric, High‑Thermal‑Stability Poly(divinylbenzene) Structures Fabricated via Stereolithography
Time: 15:50 - 16:10
Speaker
Mukai Masaru(Yokohama National University)
E10-2-4
Small-scale Soft Actuators and Robots from Photopolymerization of Liquid Crystalline Materials
Time: 16:10 - 16:30
E10-2-4
Small-scale Soft Actuators and Robots from Photopolymerization of Liquid Crystalline Materials
Time: 16:10 - 16:30
Speaker
Hamed Shahsavan(University of Waterloo)
E11. Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices
Date
June 24 (Wed.), 2026 13:30 - 15:25
Room
Room C (Room 407)(Arcrea Himeji, Room 407)
Chairperson
Itaru Osaka(Hiroshima University)
Ohkita Hideo(Kyoto University)
E11-1-1
Molecular Control of 1D Polaron Delocalization Driving High Mobility in Indacenodithiophene Copolymers
Time: 13:30 - 13:55
E11-1-1
Molecular Control of 1D Polaron Delocalization Driving High Mobility in Indacenodithiophene Copolymers
Time: 13:30 - 13:55
Speaker
Christine Luscombe(Okinawa Institute of Science and Technology)
E11-1-2
Improvement of efficiency and stability of ultraflexible emerging photovoltaics toward wearable applications
Time: 13:55 - 14:20
E11-1-2
Improvement of efficiency and stability of ultraflexible emerging photovoltaics toward wearable applications
Time: 13:55 - 14:20
Speaker
Kenjiro FUKUDA(The University of Osaka)
E11-1-3
Sheet-type image sensor for biomedical imaging and sensing
Time: 14:20 - 14:45
E11-1-3
Sheet-type image sensor for biomedical imaging and sensing
Time: 14:20 - 14:45
Speaker
Tomoyuki Yokota(The University of Tokyo)
E11-1-4
Charge Transfer Interface for Novel Optoelectronic Devices
Time: 14:45 - 15:10
E11-1-4
Charge Transfer Interface for Novel Optoelectronic Devices
Time: 14:45 - 15:10
Speaker
Seiichiro Izawa(Institute of Science Tokyo)
E11-1-5
Electroluminescent Photoresists: Extending Moore’s Law to Full-Color OLEDs
Time: 15:10 - 15:25
E11-1-5
Electroluminescent Photoresists: Extending Moore’s Law to Full-Color OLEDs
Time: 15:10 - 15:25
Speaker
Shao-Wei Lo(ETH Zurich)
E11. Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices
Date
June 24 (Wed.), 2026 15:40 - 17:00
Room
Room C (Room 407)(Arcrea Himeji, Room 407)
Chairperson
Ohkita Hideo(Kyoto University)
Minh Anh Truong(Institute for Chemical Research, Kyoto University)
E11-2-1
Charge carrier dynamics of Sn4+ based halide perovskite nanocrystals
Time: 15:40 - 16:05
E11-2-1
Charge carrier dynamics of Sn4+ based halide perovskite nanocrystals
Time: 15:40 - 16:05
Speaker
Yasuhiro Tachibana(RMIT University，The University of Osaka)
E11-2-2
Lead-Free Double Perovskite Quantum Dots for Next-Generation Optoelectronics
Time: 16:05 - 16:30
E11-2-2
Lead-Free Double Perovskite Quantum Dots for Next-Generation Optoelectronics
Time: 16:05 - 16:30
Speaker
Qing SHEN(The University of Electro-Communications)
E11-2-3
Interfacial Defect Passivation via Carboxylic Acid-Functionalized Fullerene for Efficient Tin-Based Perovskite Solar Cells
Time: 16:30 - 16:45
E11-2-3
Interfacial Defect Passivation via Carboxylic Acid-Functionalized Fullerene for Efficient Tin-Based Perovskite Solar Cells
Time: 16:30 - 16:45
Speaker
Inseob Noh(Department of Polymer Chemistry, Kyoto University)
E11-2-4
Formation kinetics of polymer films probed by aggregated-induced emissive molecules
Time: 16:45 - 17:00
E11-2-4
Formation kinetics of polymer films probed by aggregated-induced emissive molecules
Time: 16:45 - 17:00
Speaker
Hinata Tamada(Grad. Sch. of Eng., Kyoto Univ.)
E11. Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices
Date
June 25 (Thu.), 2026 09:30 - 11:00
Room
Room C (Room 407)(Arcrea Himeji, Room 407)
Chairperson
Yutaka IE(Univ. Osaka)
Kazuhiro Marumoto(University of Tsukuba)
E11-3-1
Molecular Engineering of C-Shaped ortho-Benzodipyrrole-based A-D-A type Acceptors for High-Performance Organic Solar Cells
Time: 9:30 - 9:55
E11-3-1
Molecular Engineering of C-Shaped ortho-Benzodipyrrole-based A-D-A type Acceptors for High-Performance Organic Solar Cells
Time: 9:30 - 9:55
Speaker
Yen-ju Cheng(National Yang Ming Chiao Tung University)
E11-3-2
Alkyl Substituent Effects on Cyclopentadithiophene-Based Non-Fullerene Acceptors
Time: 9:55 - 10:20
E11-3-2
Alkyl Substituent Effects on Cyclopentadithiophene-Based Non-Fullerene Acceptors
Time: 9:55 - 10:20
Speaker
Tomokazu Umeyama(University of Hyogo)
E11-3-3
Development of Multipodal Hole-Collecting Monolayer Materials for p-i-n Perovskite Solar Cells
Time: 10:20 - 10:45
E11-3-3
Development of Multipodal Hole-Collecting Monolayer Materials for p-i-n Perovskite Solar Cells
Time: 10:20 - 10:45
Speaker
Minh Anh Truong(Institute for Chemical Research, Kyoto University)
E11-3-4
Light-induced ESR analyses of PEAI-passivated perovskite solar cells
Time: 10:45 - 11:00
E11-3-4
Light-induced ESR analyses of PEAI-passivated perovskite solar cells
Time: 10:45 - 11:00
Speaker
Liqi Liu( Department of Materials Science, University of Tsukuba)
E11. Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices
Date
June 25 (Thu.), 2026 11:15 - 12:30
Room
Room C (Room 407)(Arcrea Himeji, Room 407)
Chairperson
Tomokazu Umeyama(University of Hyogo)
Itaru Osaka(Hiroshima University)
E11-4-1
Green- and Near-Infrared-Selective Organic Solar Cells: Materials Design and Agrivoltaic Application
Time: 11:15 - 11:40
E11-4-1
Green- and Near-Infrared-Selective Organic Solar Cells: Materials Design and Agrivoltaic Application
Time: 11:15 - 11:40
Speaker
Yutaka IE(The University of Osaka)
E11-4-2
Fullerene Acceptors for Efficient Charge Separation in Photocatalytic Hydrogen Evolution
Time: 11:40 - 12:05
E11-4-2
Fullerene Acceptors for Efficient Charge Separation in Photocatalytic Hydrogen Evolution
Time: 11:40 - 12:05
Speaker
Tsubasa Mikie(Hiroshima University )
E11-4-3
Molecular Orientation and Degradation in Non-Fullerene Organic Solar Cells
Time: 12:05 - 12:30
E11-4-3
Molecular Orientation and Degradation in Non-Fullerene Organic Solar Cells
Time: 12:05 - 12:30
Speaker
Kazuhiro Marumoto(Dep. Mater. Sci., Univ. of Tsukuba, Japan，OIQSST, Univ. of Tsukuba, Japan，TREMS, Univ. of Tsukuba, Japan)
E12. Fundamentals and Applications of Biomimetics Materials and Processes
Date
June 24 (Wed.), 2026 13:00 - 14:00
Room
Room B (Small Hall)(Arcrea Himeji, Small Hall)
Chairperson
ATSUSHI SEKIGUCHI(Litho Tech Japan Corporation)
Masashi Yamamoto(National Institute of Technology, Kagawa College)
E12-1-1
Microstructure-induced petal effect on hierarchical ceramic surfaces fabricated by multi-step imprinting
Time: 13:00 - 13:20
E12-1-1
Microstructure-induced petal effect on hierarchical ceramic surfaces fabricated by multi-step imprinting
Time: 13:00 - 13:20
Speaker
Daigo Kamioka(Kyushu University)
E12-1-2
Mechanical Entrainment of Oscillatory Transport Dynamics in Physarum polycephalum: Toward Biomimetic Rhythm-Responsive Systems
Time: 13:20 - 13:40
E12-1-2
Mechanical Entrainment of Oscillatory Transport Dynamics in Physarum polycephalum: Toward Biomimetic Rhythm-Responsive Systems
Time: 13:20 - 13:40
Speaker
Fujio Tsumori(Kyushu University)
E12-1-3
Ray-Tracing Analysis of Optical Functions in Leaf-Inspired Internal Structures
Time: 13:40 - 14:00
E12-1-3
Ray-Tracing Analysis of Optical Functions in Leaf-Inspired Internal Structures
Time: 13:40 - 14:00
Speaker
Rinnosuke Mori(Kyushu University)
E12. Fundamentals and Applications of Biomimetics Materials and Processes
Date
June 24 (Wed.), 2026 14:00 - 14:40
Room
Room B (Small Hall)(Arcrea Himeji, Small Hall)
Chairperson
Takeshi Ito(Kansai University)
SATOSHI TAKEI(Toyama Prefectural University)
E12-1-4
Water-Developable Negative Photoresist Material for UV Lithography Exhibiting Inclusion Effects Using Cyclodextrin Derivatives
Time: 14:00 - 14:20
E12-1-4
Water-Developable Negative Photoresist Material for UV Lithography Exhibiting Inclusion Effects Using Cyclodextrin Derivatives
Time: 14:00 - 14:20
Speaker
Hiryu Hayashi(Toyama Prefectural University)
E12-1-5
Sustainable Micro-Pattering Using Hyaluronic Acid-Based Water-Developable Negative Photoresist
Time: 14:20 - 14:40
E12-1-5
Sustainable Micro-Pattering Using Hyaluronic Acid-Based Water-Developable Negative Photoresist
Time: 14:20 - 14:40
Speaker
Momoka Kamada(Toyama Prifectual University)
E12. Fundamentals and Applications of Biomimetics Materials and Processes
Date
June 24 (Wed.), 2026 15:00 - 16:00
Room
Room B (Small Hall)(Arcrea Himeji, Small Hall)
Chairperson
Fujio Tsumori(Kyushu University)
Takayuki Murosaki(Asahikawa Medical University)
E12-2-1
Study of the High-intensity Reflection Structure that used the Speckle Exposure Method
Time: 15:00 - 15:20
E12-2-1
Study of the High-intensity Reflection Structure that used the Speckle Exposure Method
Time: 15:00 - 15:20
Speaker
ATSUSHI SEKIGUCHI(Litho Tech Japan Corporation， Osaka Metropolitan University)
E12-2-2
Hydro- and Oleophobic Properties of Neanurinae (Collembola)
Time: 15:20 - 15:40
E12-2-2
Hydro- and Oleophobic Properties of Neanurinae (Collembola)
Time: 15:20 - 15:40
Speaker
Satoru Tachibana(Kyoto University)
E12-2-3
Formation of Double-Roughness Structures on PS/PMMA Blend Film Surfaces Using Atmospheric-Pressure Low-Temperature Plasma
Time: 15:40 - 16:00
E12-2-3
Formation of Double-Roughness Structures on PS/PMMA Blend Film Surfaces Using Atmospheric-Pressure Low-Temperature Plasma
Time: 15:40 - 16:00
Speaker
Masashi Yamamoto(National Institute of Technology, Kagawa College)
E13, J1. Surface Treatment and Functionalization of Polymer Surfaces
Date
June 25 (Thu.), 2026 09:20 - 10:20
Room
Room D (Room 408)(Arcrea Himeji, Room 408)
Chairperson
Shin-ichi Kondo(Gifu Pharmaceutical University)
E13-1-1
Raman-Spectra-Based Five-Peak Deconvolution for Predicting Micro-scratch Critical Load of Diamond-Like Carbon Films
Time: 9:20 - 9:50
E13-1-1
Raman-Spectra-Based Five-Peak Deconvolution for Predicting Micro-scratch Critical Load of Diamond-Like Carbon Films
Time: 9:20 - 9:50
Speaker
Yoshihisa Osano(Okayama University of Science)
E13-1-2
流動電位法によるDLC成膜したチューブ内面の等電点測定
Time: 9:50 - 10:00
E13-1-2
流動電位法によるDLC成膜したチューブ内面の等電点測定
Time: 9:50 - 10:00
Speaker
shinsuke kunitsugu(岡山県工業技術センター)
E13-1-3
Fabrication of Photo-adhesive Materials Using a Bifunctional Dipyridyldisulfide-derived Methacryl Monomer and a Reducer
Time: 10:00 - 10:20
E13-1-3
Fabrication of Photo-adhesive Materials Using a Bifunctional Dipyridyldisulfide-derived Methacryl Monomer and a Reducer
Time: 10:00 - 10:20
Speaker
Masahiro Furutani(National Institute of Technology, Fukui College)
E13, J1. Surface Treatment and Functionalization of Polymer Surfaces
Date
June 25 (Thu.), 2026 10:30 - 11:30
Room
Room D (Room 408)(Arcrea Himeji, Room 408)
Chairperson
Tatsuyuki Nakatani(Okayama Univ. of Sci.)
E13-2-1
形状補正マスクと円錐ミラーを用いた円筒内面円周一括投影露光
Time: 10:30 - 10:50
E13-2-1
形状補正マスクと円錐ミラーを用いた円筒内面円周一括投影露光
Time: 10:30 - 10:50
Speaker
Hiroki Nishigaki(東京電機大学大学院)
E13-2-2
Surface Modification of Polystyrene Substrates via Non-thermal Atmospheric Pressure Plasma Treatment for Controlling Cell Adhesion
Time: 10:50 - 11:10
E13-2-2
Surface Modification of Polystyrene Substrates via Non-thermal Atmospheric Pressure Plasma Treatment for Controlling Cell Adhesion
Time: 10:50 - 11:10
Speaker
Kyosuke Miyagawa(Gifu Pharmaceutical University)
E13-2-3
メカノケミカル固相重合による光応答性高分子ミセルの開発
Time: 11:10 - 11:30
E13-2-3
メカノケミカル固相重合による光応答性高分子ミセルの開発
Time: 11:10 - 11:30
Speaker
Shin-ichi Kondo(岐阜薬科大学)
E13, J1. Surface Treatment and Functionalization of Polymer Surfaces
Date
June 25 (Thu.), 2026 13:30 - 14:20
Room
Room D (Room 408)(Arcrea Himeji, Room 408)
Chairperson
Masashi Yamamoto(National Institute of Technology, Kagawa College)
Ryohei Yasukuni(Osaka Institute of Technology)
E13-3-1
Etching and surface modification of organic films by atomic hydrogen annealing
Time: 13:30 - 14:00
E13-3-1
Etching and surface modification of organic films by atomic hydrogen annealing
Time: 13:30 - 14:00
Speaker
Heya Akira(Univ. of Hyogo)
E13-3-2
Effect of ortho-Methyl Group of Terminal Phenol of Dissolution Inhibitor on Sensitivity in
Chemically Amplified Three-Component Novolac Resists
Chemically Amplified Three-Component Novolac Resists
Time: 14:00 - 14:20
E13-3-2
Effect of ortho-Methyl Group of Terminal Phenol of Dissolution Inhibitor on Sensitivity in
Chemically Amplified Three-Component Novolac Resists
Chemically Amplified Three-Component Novolac Resists
Time: 14:00 - 14:20
Speaker
Katsuaki Takashima(Osaka Metropolitan University)
E13, J1. Surface Treatment and Functionalization of Polymer Surfaces
Date
June 25 (Thu.), 2026 14:30 - 15:30
Room
Room D (Room 408)(Arcrea Himeji, Room 408)
Chairperson
Hideo Horibe(Osaka Metropolitan University)
Heya Akira(University of Hyogo)
E13-4-1
Improvement of Microwave Plasma Ignition in High-Pressure Water Vapor Environment
Time: 14:30 - 14:50
E13-4-1
Improvement of Microwave Plasma Ignition in High-Pressure Water Vapor Environment
Time: 14:30 - 14:50
Speaker
Thiha Kyaw Swar(Kanazawa University)
E13-4-2
Fluorescence modification of organic nanoparticles via pulsed laser irradiation in the presence of surfactants
Time: 14:50 - 15:10
E13-4-2
Fluorescence modification of organic nanoparticles via pulsed laser irradiation in the presence of surfactants
Time: 14:50 - 15:10
Speaker
Ryohei Yasukuni(Osaka Institute of Technology)
E13-4-3
レーザー照射とオゾン水処理を用いたレジスト除去
Time: 15:10 - 15:30
E13-4-3
レーザー照射とオゾン水処理を用いたレジスト除去
Time: 15:10 - 15:30
Speaker
Yusuke Murakami(大阪工業大学大学院工学研究科)
E14. Chemistry for Advanced Photopolymer Science
Date
June 26 (Fri.), 2026 13:30 - 14:30
Room
Room C (Room 407)(Arcrea Himeji, Room 407)
Chairperson
Haruyuki Okamura(Osaka Metropolitan University)
Hideyuki Nakano(Muroran Institute of Technology)
E14-1-1
Photoinitiator-Controlled Photopolymerization of an Ultrathin Transparent Protective Overlayer
Time: 13:30 - 13:50
E14-1-1
Photoinitiator-Controlled Photopolymerization of an Ultrathin Transparent Protective Overlayer
Time: 13:30 - 13:50
Speaker
Minho Jung(Pyeongtaek-si, Gyeonggi-do, Republic of Korea, Interojo INC.)
E14-1-2
Synthesis of cyclic polystyrene via a novel photoinduced ring-expansion polymerization using 3H-benzothiazol-2-thione as a cyclic initiator
Time: 13:50 - 14:10
E14-1-2
Synthesis of cyclic polystyrene via a novel photoinduced ring-expansion polymerization using 3H-benzothiazol-2-thione as a cyclic initiator
Time: 13:50 - 14:10
Speaker
Atsushi Kameyama(Kanagawa University)
E14-1-3
Sodium Thiophenolate Initiated Polymerization of Methacrylate with Sulfur (S8): High Refractive Index Dual Tone Photoresists.
Time: 14:10 - 14:30
E14-1-3
Sodium Thiophenolate Initiated Polymerization of Methacrylate with Sulfur (S8): High Refractive Index Dual Tone Photoresists.
Time: 14:10 - 14:30
Speaker
Xiaofei Qian(Fudan University)
E14. Chemistry for Advanced Photopolymer Science
Date
June 26 (Fri.), 2026 14:50 - 15:50
Room
Room C (Room 407)(Arcrea Himeji, Room 407)
Chairperson
Haruyuki Okamura(Osaka Metropolitan University)
Atsushi Kameyama(Faculty of Chemistry and Biochemistry, Kanagawa University)
E14-2-1
Creation of Chiral Molecular Glasses
Time: 14:50 - 15:10
E14-2-1
Creation of Chiral Molecular Glasses
Time: 14:50 - 15:10
Speaker
Hideyuki Nakano(Muroran Institute of Technology)
E14-2-2
Photo-thermal Degradation of Stimuli-Sensitive Polymers with Epoxy and Tertiary Ester Moieties
Time: 15:10 - 15:30
E14-2-2
Photo-thermal Degradation of Stimuli-Sensitive Polymers with Epoxy and Tertiary Ester Moieties
Time: 15:10 - 15:30
Speaker
Haruyuki Okamura(Osaka Metropolitan University)
E14-2-3
Light- and Heat-Triggered Degradation of Dual-Stimuli-Responsive Polymer Brushes Generating Bubbles with a Photoacid Generator
Time: 15:30 - 15:50
E14-2-3
Light- and Heat-Triggered Degradation of Dual-Stimuli-Responsive Polymer Brushes Generating Bubbles with a Photoacid Generator
Time: 15:30 - 15:50
Speaker
Haruyuki Okamura(Osaka Metropolitan University)