Speakers

Plenary Speakers

Hirotaka Toyoda (Nagoya University, Japan)

Title: Diagnostics of processing plasmas

Speaker Introduction

TBA

Bruce R. Lock (Florida State University, USA)

Title: Gas-Liquid Plasma Reactors for Chemical and Environmental Applications

Speaker Introduction

Bruce R. Locke is Professor and Chair of the Department of Chemical and Biomedical Engineering at the FAMU-FSU College of Engineering where he has been a faculty member since 1989. He earned his B.E. with a double major in Chemical Engineering and Environmental and Water Resources Engineering from Vanderbilt University in 1980, M.S. degree in Chemical Engineering from the University of Houston in 1982 and Ph.D. in Chemical Engineering from North Carolina State University in 1989. He served as Associate Provost at Florida State University (2012-2018), Interim Dean of the FAMU-FSU College of Engineering (2015-2016), and Department Chair (2004-2012 and 2019-present). He was named a Distinguished University Research Professor at Florida State University in 2010.

Dr. Locke has made major contributions to the field of plasma chemical reaction engineering for chemical synthesis and environmental pollution control, with particular emphasis on gas-liquid plasma reactor design and development. He has also made important contributions in bioengineering to the analysis of chemical reaction/diffusion processes in muscle metabolism and transport in multiphase media including proteins and nucleic acids in gels and cell growth in tissue engineering. Dr. Locke has published 150 reviewed journal papers and 8 book chapters and he holds 13 US patents of which 7 are currently licensed. He was a visiting professor in Japan, France, and China, and was a US Fulbright Research Scholar at the Institute of Plasma Physics, Czech Academy of Sciences. He is a Fellow of the American Institute of Chemical Engineers, the National Academy of Inventors, and the Academy of Science Engineering and Medicine of Florida, and he is co-Editor-in-Chief of the journal Plasma Chemistry and Plasma Processing published by Springer Nature.

Invited Speakers

1. Production and Control of Low Pressure Reactive Plasmas

2. Production and Control of Atmospheric Pressure and Thermal Plasmas

Atsushi Komuro (National Institute of Advanced Industrial Science and Technology (AIST), Japan)
Streamer Dynamics and Plasma Chemistry in Atmospheric‑Pressure Streamer and Dielectric Barrier Discharges

Pierre Freton (LAPLACE Laboratory, University of TOULOUSE, France)
To be announced

3. Production and Cotnrol of Liquid-Phase and Gas-Liquid Interface Plasmas

Jun-Seok Oh (Osaka Metropolitan University, Japan)
Evaluation of plasma induced reactive oxygen species using gas-liquid interface reaction

Peter Bruggeman (Department of Mechanical Engineering, University of Minnesota, USA)
Plasma-Liquid Interactions: Mechanistic Studies to Enable Reaction Control. 

Van Phuoc Thai (HCMC University of Technology and Education, Vietnam)
Plasma–Liquid Interactions as a Platform for Controlled Reactive Species and Nanomaterial Design

4. Diagnostics, Measurement and Monitoring of Reactive Plasmas

Sanghoo Park (National University of Singapore, Singapore)
Real-time three-dimensional monitoring of capacitively coupled plasmas via optical emission tomography

Tat Loon Chng (Osaka Metropolitan University, Japan)
Recent Advances in Electric Field Measurements of Non-Equilibrium Discharges using the E-FISH Method

Tomáš Hoder (Leibniz Institute for Plasma Science and Technology, Germany; Masaryk University, Czech)
Advanced Non-equilibrium Plasma Diagnostics Supported by Numerical Modelling

JAN Kuhfeld (Hokkaido University, Japan)
Advanced absorption spectroscopy methods in low-temperature plasmas

5. Elementary Processes in Reactive Plasmas

Satoru Kawaguchi (Muroran Institute of Technology, Japan)
Measurement of Electron Swarm Parameters Leveraging Bayesian Statistics and Machine Learning Approaches

Miran Mozetič (Jozef Stefan Institute, Slovenia)
Precise dosing of reactive plasma species for desired surface finish of organic materials

6. Modeling and Simulation in Reactive Plasmas

Jungmi Hong (University of Sydney, Australia)
Modeling the Role of Surface Reactions in Zero-D Plasma Chemistry

Ho Jun Kim (Hanyang University, Koera)
Gas Flow–Driven Mechanisms for Process Uniformity in Plasma Processing Equipment

7. Etching

Makoto Sekine (Nagoya University, Japan)
Cryogenic Etching of Dielectric Materials Using HF plasma

Thomas Tillocher (GREMI - University of Orleans - CNRS, France)
To be announced

8. Deposition

Hu Li (Tokyo Electron America, Inc., USA )
To be announced

Nobuyuki Kuboi (Sony Semiconductor Solutions Corporation, Japan)
Plasma-surface interactions on deposition processes for Si dielectric films

Petr Vasina (Masaryk University, Czech Republic)
Understanding Reactive Magnetron Sputtering through Sputtered Particle Flux and Concentration Measurements

9. Surface Modification

Lenka Zajickova (CEITEC & Masaryk University,Brno, Czech Republic)
To be announced

10. Applications for Nanotechnology

11. Applications for Environment and Energy

Hyun-Ha Kim (National Institute of Advanced Industrial Science and Technology (AIST), Japan)
Plasma Nitrogen Fixation for Power-to-X (Tentative)

Tomoyuki Kuroki (Osaka Metropolitan University, Japan)
Exhaust Gas Treatment Using Atmospheric-Pressure Nonthermal Plasma

12. Applications for Life Sciences

Hirofumi Kurita (Toyohashi Institute of Technology, Japan)
Strategies for modulating cellular responses via low-dose cold atmospheric plasma treatment (Tentative)

Yuki Yanagawa(Chiba University, Japan)
Effect of atmospheric-pressure plasma in plants.

13. Applications for Propulsion and Aerodynamics

Eric Moreau (University of Poitiers, France)
To be announced

Kazunori Takahashi (Tohoku University, Japan)
To be announced

14. New Trends of Reactive Plasmas / Emerging Technologies

Tomohiro Nozaki (Institute of Science Tokyo, Japan)
Plasma Catalysis Enabling Sustainable C1-chemistry