The next Decade of Lithography

Jo Finders (ASML BV, Netherlands)

Biography

Born in 1963 in Kerkrade, the Netherlands, Jo graduated in Physics with MSc in 1987, and PhD in 1991 from Aachen University of Technology, Germany.
From 1991- 1994 he worked as a member of technical staff at the Aachen University of technology on the spectroscopic analysis of artificial diamond layers.
He joined IMEC in 1994. As a member of the micro patterning group he was active in various fields of optical lithography such as resolution enhancement techniques, CD-control and wafer CD-metrology.
In 1997 he joined ASML. Since than he was acting in various areas around DUV and EUV imaging. In June 2006 he was elected as an ASML fellow and in 2018 as an SPIE fellow.
Currently he is managing the EUV imaging and focus group within system engineering at ASML. Jo holds over 45 patents and has (co) authored more than 100 papers is the field of optical lithography.