Symposium Information


Photomask Japan 2024
The 30th Symposium on Photomask and NGL Mask Technology


Date: Tuesday, April 16 - Thursday, April 18, 2024
Venue: Annex Hall, PACIFICO YOKOHAMA, Yokohama, Japan
Official Language

: English

Organized by

: Photomask Japan and SPIE

Co-organized by

: BACUS and EMLC


Technical Exhibition in Cooperation with SEMI Japan


   
Registration Desk


Tuesday, April 16
 8:15 - 18:30  *Registration for FPD Session only: 10:20 -
Wednesday, April 17
 8:30 - 18:00
Thursday, April 18 

8:30 - 18:00



   
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