Abstract Submission

• Abstracts must be written and presented in English.
• All abstracts must be submitted electronically in a PDF File via this symposium website. No fax and e-mail submission are accepted.
• Deadline: November 30, 2023 December 7, 2023(extended). Please note: the electronic abstract submission system will be closed on December 7, 2023 and late abstracts will not be accepted.

• You will receive your registration number on your "my page" when the submission succeeds.   

     If the registration number doesn't show up, please contact the Abstract Submission Office.

Please click here to download “PMJ2024 Abstract Template”.

This describes instructions for the preparation of an abstract and can be used as a template.

1. Title of Abstract:

The title of the abstract should be written in Times New Roman, bold, 16pt, centered. Initial letters of each word should be capitalized.

2. Names of All Authors:

Author's name and affiliation spelled out completely in Times New Roman, 12pt, centered. Initial letters of each word must be capitalized. If there are several authors or affiliations, Presenting Author should be listed first and the related numbers should be given using superscripts. Also include the mailing address, and email address.

3. Abstract Text and Figures:

Text should be approximately 250 words, not exceeding one A4 page including figures.

4. Keywords:

List maximum of five keywords. Please choose at least one keyword for your abstract.

NOTE

From 2019, the one-page abstract which will be submitted by December 7, 2023 basically will be used for “Photomask Japan 2024 Digest of Papers”.

Please keep in mind that No Camera-ready Abstract is needed.

* It is possible to replace the accepted abstract to the revised one for “Digest of Papers” no later than February 15, 2024. How to submit the revised abstract will be notified in the middle of January 2024.

Copyright Transfer Policy

The copyrights for your Abstract shall be transferred to the Photomask Japan.

Otherwise, your Abstract shall not be accepted for presentation nor be included in the digest of papers.

However, the authors reserve the following rights:

1. Retain all proprietary rights other than copyright, such as patent rights.
2. Reuse all or portions of the above abstract in other works.
3. Reproduce, or have reproduced, the above abstract for the author’s personal use or for company use, provided that the copies are not offered for sale.

Please agree the Copyright Transfer Policy above by checking a box in the online submission form.

You are requested to choose topic applicable to your abstract from among the items listed in the Themes and Topics below.

 1.  Materials for photomasks

 2.  Fabrication process steps and equipment for photomasks (developing, etching, cleaning etc.)

 3.  Photomask writing tools and technologies including multi-beam EB writer

 4.  Tools and technologies for metrology/ inspection/ repair

 5.  Technologies and infrastructures for EUVL/ NIL/ FPD masks

 6.  EDA, MDP, curvilinear ILT and DTCO

 7.  Photomasks with RET: PSM, OPC, SMO and multiple patterning

 8.  Photomask-related lithography technologies

 9.  NGL mask technologies and their applications: DSA and others

10. Strategy and business challenges: cost, cycle time and total mask solutions

11. Patterning technologies for semiconductor and electronic devices

12. Semiconductor manufacturing technologies

13. eBeam direct writing and eBeam lithography technologies

14. Utilizing AI technologies for the efficiency of R&D and HVM

15. Legacy tools for middle and low-end masks

16. Photomask and lithography related technologies in academia

PMJ offers an opportunity for university students or postdoctoral researchers to present their works on

mask/ lithography technology fields.

Those who wish to present their works need to submit an abstract via online in accordance with the above.

Session Scope:

Mask technology, lithography technology and applications

Object Presenter:

Applicants should be university students or postdoctoral researchers

Registration fee:

Free for Academia

Photomask Japan Program Committee will review all contributed abstracts.

Applicants will be notified of acceptance or rejection by e-mail no later than the end of January 2024.

Manuscript

Please note that the accepted authors should submit their 4-to-6-page manuscript for SPIE Proceedings.

The author guidelines for manuscript will be available on this symposium website in January 2024.

1) Presentation Style

1. Oral presentation: Online live presentation (include Q&A): Zoom Webinars

　* Live presentation (without Q&A) will be recorded and used for on-demand broadcasting after the session.

2. Poster presentation: Online live presentation in Zoom breakout rooms (include Q&A): Zoom Meetings

　* Poster presentation material (PDF file) will be used for on-demand distribution. (no video will be distributed)

2) Program Overall

- Program will be organized considering the time zone difference among the presenters.

[Note]

While live presentations, audiences will be able to ask questions freely.

3) Presentation Materials:

- The detailed guidelines will be available later.

Photomask Japan Abstract Submission Office

c/o PCO Co., Ltd.

2-25 Sakurabashidori, Toyama, 930-0004

E-mail: pmj@pcojapan.jp

   Submission      Guideline for Submission

*Note:

In Online Abstract Submission System, SSL certificate errors may occur depending on the type of browsers or security software.

There is no problem if you click the button of “Continue to this website” and go back to the procedure of abstract submission.