Committee

Abstract Submission


To Submit an Abstract

  • Abstracts must be written and presented in English.
  • All abstracts must be submitted electronically in a PDF File via this symposium website. No fax and e-mail submission are accepted.
  • Deadline: November 30, 2024. Please note: the electronic abstract submission system will be closed on November 30, 2024 and late abstracts will not be accepted.
  • You will receive your registration number on your "my page" when the submission succeeds.   

    •      If the registration number doesn't show up, please contact the Abstract Submission Office.


    Instructions to Authors for the Preparation of your Abstract


    Please click here to download “PMJ2025 Abstract Template”.

    This describes instructions for the preparation of an abstract and can be used as a template.



    All abstracts must contain the following information


    1. Title of Abstract:

    The title of the abstract should be written in Times New Roman, bold, 16pt, centered. Initial letters of each word should be capitalized.

    2. Names of All Authors:

    Author's name and affiliation spelled out completely in Times New Roman, 12pt, centered. Initial letters of each word must be capitalized. If there are several authors or affiliations, Presenting Author should be listed first and the related numbers should be given using superscripts. Also include the mailing address, and email address.

    3. Abstract Text and Figures:

    Text should be approximately 250 words, not exceeding one A4 page including figures.

    4. Keywords:

    List maximum of five keywords. Please choose at least one keyword for your abstract.

    NOTE


    From 2019, the one-page abstract which will be submitted by November 30, 2024 basically will be used for “Photomask Japan 2025 Digest of Papers”.

    Please keep in mind that No Camera-ready Abstract is needed.


    It is possible to replace the accepted abstract to the revised one for “Digest of Papers” no later than February 15, 2025. How to submit the revised abstract will be notified in the middle of January 2025


    Copyright Transfer Policy

    Copyright Transfer Policy


    The copyrights for your Abstract shall be transferred to the Photomask Japan.
    Otherwise, your Abstract shall not be accepted for presentation nor be included in the digest of papers.
    However, the authors reserve the following rights:


    1. Retain all proprietary rights other than copyright, such as patent rights.
    2. Reuse all or portions of the above abstract in other works.
    3. Reproduce, or have reproduced, the above abstract for the author’s personal use or for company use, provided that the copies are not offered for sale.

    Please agree the Copyright Transfer Policy above by checking a box in the online submission form.


    Topics

    You are requested to choose topic applicable to your abstract from among the items listed in the Themes and Topics below.


      1. Materials for photomasks
      2. Fabrication process steps and equipment for photomasks
      3. Photomask writing tools and technologies including multi-beam EB writer
      4. Tools and technologies for metrology/ inspection/ repair
      5. Technologies and infrastructures for EUVL masks
      6. Technologies and infrastructures for NIL masks
      7. Technologies and infrastructures for FPD masks
      8. EDA, MDP, Curvilinear ILT and DTCO
      9. Photomasks with RET: PSM, OPC, SMO and multiple patterning
    10. Photomask-related lithography technologies
    11. NGL mask technologies and their applications: DSA and others
    12. Strategy and business challenges: cost, cycle time and total mask solutions
    13. Patterning technologies for semiconductor and electronic devices
    14. Semiconductor manufacturing technologies
    15. Advanced package, Chiplets
    16. eBeam direct writing and eBeam lithography technologies
    17. Utilizing AI technologies for the efficiency of R&D and HVM
    18. Legacy tools for middle and low-end masks
    19. Photomask and lithography related technologies in academia

    Photomask and Lithography related Technology in Academia

    PMJ offers an opportunity for university students or postdoctoral researchers to present their works on mask/ lithography technology fields.
    Those who wish to present their works need to submit an abstract via online in accordance with the above.


    Session Scope:
    Mask technology, lithography technology and applications

    Object Presenter:
    Applicants should be university students or postdoctoral researchers

    Registration fee:
    Free for Academia


    Notification of Acceptance

    Photomask Japan Program Committee will review all contributed abstracts.
    Applicants will be notified of acceptance or rejection by e-mail no later than the end of January 2025


    Manuscript


    Please note that the accepted authors should submit their 4-to-6-page manuscript for SPIE Proceedings.
    The author guidelines for manuscript will be available on this symposium website in January 2025.


    For any inquiries about abstract submission, please contact

    Photomask Japan Abstract Submission Office

    c/o ;PCO Co., Ltd.

    2-25 Sakurabashidori, Toyama, 930-0004

    E-mail: pmj@pcojapan.jp

    Submission Guideline for Submission

    *Note:
    In Online Abstract Submission System, SSL certificate errors may occur depending on the type of browsers or security software.
    There is no problem if you click the button of “Continue to this website” and go back to the procedure of abstract submission.


    TOP