Symposium Information


Photomask Japan 2025
The 31st Symposium on Photomask and NGL Mask Technology


Date: Wednesday, April 16 - Friday, April 18, 2025
Venue: Annex Hall, PACIFICO YOKOHAMA, Yokohama, Japan
Official Language

: English

Organized by

: Photomask Japan and SPIE

Co-organized by

: BACUS and EMLC


Technical Exhibition in Cooperation with SEMI Japan

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