Date: April 16(Wed.)-18(Fri.), 2025.
Venue: Annex Hall, PACIFICO YOKOHAMA, Yokohama, Japan


What's New!


Topics
Papers are solicited on the following and related topics:
  1. Materials for photomasks
  2. Fabrication process steps and equipment for photomasks (developing, etching, cleaning etc.)
  3. Photomask writing tools and technologies including multi-beam EB writer
  4. Tools and technologies for metrology/ inspection/ repair
  5. Technologies and infrastructures for EUVL/ NIL/ FPD masks
  6. EDA, MDP, curvilinear ILT and DTCO
  7. Photomasks with RET: PSM, OPC, SMO and multiple patterning
  8. Photomask-related lithography technologies
  9. NGL mask technologies and their applications: DSA and others
10. Strategy and business challenges: cost, cycle time and total mask solutions
11. Patterning technologies for semiconductor and electronic devices
12. Semiconductor manufacturing technologies
13. Advanced package, Chiplets
14. eBeam direct writing and eBeam lithography technologies
15. Utilizing AI technologies for the efficiency of R&D and HVM
16. Legacy tools for middle and low-end masks
17. Photomask and lithography related technologies in academia


Program Summary of Past PMJs (Written in Japanese)

 PMJ2024学会報告　 PMJ2023学会報告　 PMJ2022学会報告　 PMJ2021学会報告　 PMJ2019学会報告　　


Photomask Japan 2025 is the 31st international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion.


Photomask Japan Secretariat

c/o PCO Co., Ltd.
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