Panel Discussion

Date & Time	April 10, 16:55-18:20
Theme	"50th anniversary of EB mask writer and patterning technology towards below 15nm assist feature's era"
Panel Moderator	Takaharu Nagai, Dai Nippon Printing Co., Ltd. (Japan) Kazunori Seki, Tekscend Photomask Corp.(Japan)
Panelists	Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan) Tadahiro Takigawa, ALITECS Corporation (Japan) Elmar Platzgummer, IMS nanofabrication GmbH（Austria） Jo Finders, ASML Netherlands B.V. (Netherlands) Kei Yamamoto, FUJIFILM Corporation (Japan) Jeff Chen, Applied Materials, Inc.（U.S.A）