Keynote Speaker

High-NA EUV lithography: an evolutionary step toward next-generation single patterning

Vicky Philipsen (imec)

Biography

Vicky Philipsen received her PhD degree in solid-state physics from the University of Leuven (Belgium) in 2001. At imec she joined the Lithography department.
She has authored and co-authored over 150 papers published in peer-reviewed international conference proceedings and technical journals, presented several invited conference talks and one conference keynote. She has also been serving in conference committees of SPIE Advanced lithography and MNE and organized several industry workshops.

At PMJ2026 she will deliver her second conference keynote. She is the proud conference chair of the 2026 SPIE Photomask Technology conference. Early 2026 she was recognized with the SPIE Fellowship.
Currently in imec's Advanced Patterning department, she is leading the mask R&D center, managing a team of lithographers and guiding students.

Her research domain involves the study of mask 3D imaging effects in lithography (from 193nm to EUV and beyond) both by simulations and experiments.