GREETING

Hitoshi Wakabayashi
24th IIT 2024 Conference Chair and
the faculty member at the Tokyo Institute of Technology, Japan

The 24th International Conference on Ion Implantation Technology 2024 (24th IIT 2024) is the 24th Conference in the biennial series focused on discussion of major challenges in current and emerging technologies related to implant/doping and annealing processes, device applications, equipment, metrology and modeling. The Conference offers an excellent opportunity for engineers and researchers in industry, research institutes and universities to present new results and to discuss ideas of new applications of ion implantation and annealing. The organizers welcome contributions from a wide range of topics, from fundamental research to industrial applications and equipment.

A two-day school on fundamental and practical aspects of ion implantation and annealing operations in research and IC production environments will be held prior to the 24th International Conference on Ion Implantation Technology in Toyama, Japan, in September 2024. This school, which has preceded IIT meetings since 1982, will be taught by an expert group of a dozen instructors with many years of hands-on experience in the design, construction and operation of ion implantation and annealing tools as well as practical experience in process development and metrology. All attendees of the school will receive a hardbound ≈600 page book containing tutorial chapters written by the instructors for follow-on study.

We are looking forward to meeting with you in Toyama, Japan on September 2024, sharing excellent technical contents and enjoying Japanese cuisine with all of you.

August 2023,